多功能高离化率真空镀膜控制系统研制

发布时间：2018-02-22 08:09

本文关键词： 高离化率可调脉冲磁控溅射电源脉冲增强电子发射电源自动控制　出处：《哈尔滨工业大学》2014年硕士论文　论文类型：学位论文

【摘要】：高离化率在离子沉积领域有非常重要的意义，不但可以提高薄膜的密度和结合力等性能，还能沉积复杂工件，降低沉积温度、对沉积材料到不同区域有导向作用。可调脉冲高功率磁控溅射技术（MPP）和脉冲增强电子发射技术（P3e）都具有很高的离化率，本文分别研制这两种技术的电源，并结合其他真空设备，研发了一套多功能真空镀膜控制系统。要实现包括MPP和P3e电源在内的真空设备自动控制，必须先解决设备之间数据的通讯。采用西门子S2-700型PLC作为系统的通讯模块，用SIMATIC LAD编写PLC通讯程序，实现了“一主多从”的通讯模式；针对不支持数字通讯的模拟量，研制了485转换电路，开关量采用的是YC1008数字量输入输出模块；计算机采用Labview2013和OPC Servers编写显示界面。通讯完成后，根据功能编写自动程序，实现相应的设置和检测功能。自行研制的MPP电源工艺参数是平均功率为5kW，脉冲功率达到400kW，总频率设定范围17~400Hz，小波形频率占空比连续可调，并且可以根据需要设置下拉波形，，调整波形振荡的程度。在水负载试验中，通过设定不同电参数得到复杂的电压电流波形；在真空室对Cr靶放电特性进行研究，解释了振荡对MPP放电的影响；研究MPP、DCMS和HPPMS电源对Cr靶的放电光谱，比较同功率三种电源放电光谱谱线和辉光强度，分析得出MPP电源的金属离化率高于DCMS。自行研制的P3e电源工艺参数：频率22.7~1.17kHz，脉宽55μs~620μs，脉冲电流0~400A，平均电流0~60A。在水负载试验中，通过设定不同电参数验证电源的能力；在真空室内研究电源在不同频率下Ti靶的放电特性；在真空室内测量电源工作时的基体电流，选择直流电源作为对照组，研究气压和电参数对金属离化率的综合影响。
[Abstract]:High ionization rate is of great significance in the field of ion deposition. It can not only improve the density and adhesion of films, but also deposit complex workpieces and reduce deposition temperature. Both adjustable pulse high power magnetron sputtering (MPP) and pulse enhanced electron emission (P3e) have high ionization rate. In this paper, the power supply of these two technologies has been developed and combined with other vacuum equipment. A multifunctional vacuum coating control system is developed. In order to realize the automatic control of vacuum equipment including MPP and P3e power supply, the communication of data between the equipments must be solved first. Siemens S2-700 PLC is adopted as the communication module of the system, and the PLC communication program is written with SIMATIC LAD. The communication mode of "one master, more than one slave" is realized, and the YC1008 digital input and output module is used in the switching circuit for the analog signal which does not support digital communication. The computer uses Labview2013 and OPC Servers to write the display interface. After the communication is completed, the automatic program is written according to the function to realize the corresponding setting and detecting function. The process parameters of the self-developed MPP power supply are the average power of 5 kW, the pulse power of 400 kW, the total frequency setting range of 17 ~ 400 Hz, the continuous adjustment of the duty cycle of the small waveform frequency, and the setting of pull-down waveform according to the need. In the water load test, complex voltage and current waveforms are obtained by setting different electrical parameters, and the discharge characteristics of Cr target in vacuum chamber are studied to explain the effect of oscillation on MPP discharge. The discharge spectra of MPP and HPPMS power supply on Cr target are studied. The discharge spectral lines and glow intensity of three kinds of power sources are compared. The metal ionization rate of MPP power supply is higher than that of MPP power supply. The technological parameters of P3e power supply developed by ourselves are as follows: frequency 22.7v 1.17kHz, pulse width 55 渭 s / L 620 渭 s, pulse current 0400 A, average current 0.60A. in water load test, the power supply capability is verified by setting different electrical parameters. The discharge characteristics of Ti target at different frequencies were studied in the vacuum chamber, and the influence of gas pressure and electrical parameters on the ionization rate of metal was studied by measuring the matrix current of the power supply in the vacuum chamber and selecting the DC power source as the control group.
【学位授予单位】：哈尔滨工业大学
【学位级别】：硕士
【学位授予年份】：2014
【分类号】：TB43;TP273

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