磁过滤阴极弧法制备CrCN薄膜结构与组分研究

发布时间：2018-03-06 06:09

本文选题：CrCN　切入点：结构分析　出处：《表面技术》2017年01期 　论文类型：期刊论文

【摘要】：目的通过磁过滤阴极弧沉积技术制备质量优异的CrCN涂层。研究乙炔/氮气混合气体流量以及基底偏压对薄膜结构和成分的影响。方法采用磁过滤真空阴极弧沉积技术,在20~100 m L/min变化的乙炔/氮气混合气体流量参数下沉积CrCN复合薄膜。通过X射线衍射、场发射电子显微镜、扫描探针显微镜、X射线光电子能谱仪、透射电镜,对薄膜的物相结构和形貌进行分析。结果随着气体流量的增加,CrCN复合薄膜的晶粒逐渐减小最终向非晶化转变。TEM结果表明,在CrCN复合薄膜中有大量几纳米到十几纳米的纳米晶浸没在非晶成分中。SPM表明,随着基底偏压由 200 V增大到 150 V,CrCN薄膜的表面粗糙度Sa由0.345 nm上升至4.38 nm。XPS、TEM和XRD数据表明,薄膜中Cr元素主要以单质Cr、Cr N以及Cr3C2的形式存在。结论采用磁过滤真空阴极弧沉积技术制备的CrCN复合薄膜具有纳米晶-非晶镶嵌结构。该方法沉积的CrCN薄膜的表面粗糙度与基底负偏压有关。混合气体的流量变化对薄膜组分的变化几乎无影响。
[Abstract]:Aim to prepare CrCN coating with excellent quality by magnetic filter cathodic arc deposition. The effects of acetylene / nitrogen mixture gas flow rate and substrate bias on the structure and composition of the film were studied. The CrCN composite films were deposited under the parameters of acetylene / nitrogen mixture gas flow rate of 20 ~ 100ml / min. X-ray diffraction, field emission electron microscope, scanning probe microscope, X-ray photoelectron spectrometer, transmission electron microscope were used. The phase structure and morphology of the films were analyzed. Results with the increase of gas flow rate, the grain size of CrCN composite thin films gradually decreased to amorphous transition. A large number of nanocrystallines from several to more than ten nanometers were immersed in amorphous composition in CrCN composite films. The results showed that the surface roughness sa of the films increased from 0.345 nm to 4.38 nm and XRD data showed that with the increase of substrate bias voltage from 200V to 150V, the surface roughness of the films increased from 0.345 nm to 4.38 nm, and the results of TEM and XRD showed that the surface roughness of the films increased from 0.345 nm to 4.38 nm. The Cr elements in the films are mainly in the form of Cr N and Cr3C2. Conclusion the CrCN composite films prepared by magnetic filtration vacuum cathode arc deposition have nanocrystalline amorphous mosaic structure. The surface of CrCN thin films deposited by this method is very clear. The surface roughness is related to the negative bias of the substrate and the flow rate of the mixed gas has little effect on the change of the composition of the film.
【作者单位】：西南大学材料与能源学部;北京师范大学射线束技术与材料改性教育部重点实验室;
【基金】：国家自然科学基金项目(11305009) 射线束技术与材料改性教育部重点实验室开放课题资助项目(201411) 博士基金(西南大学)资助项目(104230-20710909)~~
【分类号】：TB383.2

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