光电极值法结合外差干涉法监控膜厚的研究

发布时间：2018-03-24 01:00

本文选题：光电极值法　切入点：光学薄膜　出处：《光学技术》2017年02期

【摘要】：光电极值法是光学薄膜厚度监测的常用方法,该方法在镀膜前引用块状材料的折射率设计膜系。而在实际镀制过程中,用于镀制光学薄膜的材料折射率会发生改变,从而给膜厚的监控带来误差。为了避免折射率变化的影响,采用外差干涉法测量折射率,将实际测得的薄膜折射率应用光电极值法监控薄膜的设计,从而减少了因材料折射率的变化引起的误差。以750nm截止滤光片的镀制为被测对象进行了实验,对制备的滤光片透射率光谱曲线进行了比较。结果表明,实际的透射率曲线与设计的透射率曲线吻合较好,两次实验曲线平均吻合度均在98%以上,系统稳定性很好,从而说明结合外差干涉法的光电极值监控法可以很好地克服折射率变化引起的误差。
[Abstract]:The optoelectronic extreme value method is a common method to monitor the thickness of optical thin films. The refractive index design system of bulk materials is used in this method before coating. However, the refractive index of materials used for optical thin films will change in the process of actual plating. In order to avoid the influence of refractive index change, the refractive index is measured by heterodyne interferometry. Therefore, the error caused by the change of refractive index of the material is reduced. The experiment is carried out with the plating of the 750nm cut-off filter as the measured object, and the transmittance spectral curves of the prepared filter are compared. The results show that, The actual transmittance curve is in good agreement with the designed transmittance curve. The average coincidence of the two experimental curves is above 98%, and the stability of the system is very good. It shows that the optoelectronic extreme value monitoring method combined with heterodyne interferometry can overcome the error caused by refractive index change.
【作者单位】：上海理工大学光电信息与计算机工程学院;上海市现代光学系统重点实验室;
【基金】：国家重大仪器专项(2014YQ09070903,2013YQ03065104) 863计划(2015AA020401)
【分类号】：O484.5

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