溅射靶材用高纯钌粉制备技术研究及进展

发布时间：2018-04-30 00:24

  本文选题：钌靶 + 钌粉　； 参考：《贵金属》2017年S1期

【摘要】：电子工业生产钌靶对所用的钌粉纯度(99.999%)、分散性、形貌和尺寸等有严格的要求。国内目前只能在实验室制备出高性能的钌粉,尚未应用于生产,在制备高性能钌粉方面与国外有较大差距,且国内钌靶用钌粉主要依靠进口。通过分析和总结了国内外钌靶用钌粉的生产方法、工艺和测试方法,并对国内钌靶用钌粉的制备提出了建议。
[Abstract]:Ruthenium target produced in electronic industry has strict requirements for the purity, dispersity, morphology and size of the ruthenium powder used. At present, the high performance ruthenium powder can only be prepared in the laboratory in our country, but it has not been used in the production. There is a big gap between the preparation of high performance ruthenium powder and foreign countries, and the domestic ruthenium target ruthenium powder mainly depends on the import. The production method, process and testing method of ruthenium powder for ruthenium target at home and abroad were analyzed and summarized, and some suggestions for the preparation of ruthenium powder for ruthenium target in China were put forward.
【作者单位】： 昆明贵金属研究所稀贵金属综合利用新技术国家重点实验室;西北有色金属研究院;
【基金】：云南省科技计划项目-重点新产品(2016BA001) 云南省引进海外高层次人才项目(13020149)
【分类号】：TF123.2
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本文编号：1822240