氮气流量对热丝增强等离子体磁控溅射制备CrN_x薄膜组织结构与性能的影响

发布时间：2018-05-25 06:50

本文选题：热丝增强等离子体磁控溅射 + CrNx薄膜　；参考：《真空科学与技术学报》2017年10期

【摘要】：采用热丝增强等离子体磁控溅射技术在SKD61钢基体上制备了CrN_x薄膜,并分析研究了不同氮气流量对薄膜相结构、组织形貌、粗糙度、厚度、耐磨性、膜基结合力以及纳米硬度和弹性模量的影响。结果表明:在较宽的氮气流量变化范围内可制备出厚度均匀、结构致密、高硬度及高耐磨性的CrN_x薄膜。随氮气流量增加,薄膜由Cr2N及CrN双相组成转变为CrN单相。由于复杂相及相取向的存在,氮气流量为90 mL/min的CrN_x薄膜内应力最大,膜基结合力最低。CrN_x薄膜使SKD61钢的纳米硬度、弹性模量及耐磨性能均大幅提高,最高纳米硬度及弹性模量分别达36 GPa,477 GPa。通过对材料韧性的综合评价,氮气流量为75 mL/min条件下所制得的以Cr_2N相为主的薄膜的韧性最佳。
[Abstract]:CrN_x thin films were prepared on SKD61 steel substrates by hot-wire enhanced plasma magnetron sputtering. The phase structure, microstructure, roughness, thickness and wear resistance of the films with different nitrogen flow rates were investigated. The effect of film base adhesion, nano hardness and elastic modulus. The results show that CrN_x thin films with uniform thickness, dense structure, high hardness and high wear resistance can be prepared in a wide range of nitrogen flow rates. With the increase of nitrogen flow rate, the film changes from Cr2N and CrN biphase to CrN single phase. Due to the existence of complex phase and phase orientation, the internal stress of CrN_x film with nitrogen flow rate of 90 mL/min is the largest, and the lowest adhesion of film substrate. CrNx thin film can greatly improve the nano-hardness, elastic modulus and wear resistance of SKD61 steel. The highest hardness and modulus of elasticity were 36 GPA and 477 GPA, respectively. Through the comprehensive evaluation of the toughness of the materials, the film with Cr_2N phase was the best prepared at the nitrogen flow rate of 75 mL/min.
【作者单位】：辽宁科技大学表面工程研究所;
【基金】：国家自然科学基金项目(51372109,51672119,51401201,51502126) 辽宁省教育厅校企成果转化项目(601009817-01) 辽宁省百千万人才项目(201571)
【分类号】：TB383.2

【相似文献】