P偏振ArF准分子激光大角度减反射薄膜的研究与制备

发布时间：2018-06-29 09:19

本文选题：光刻技术 + ArF　；参考：《中国科学院研究生院(长春光学精密机械与物理研究所)》2014年博士论文

【摘要】：ArF准分子激光由于其光斑的高功率、高均匀性和高稳定性越来越多地应用于半导体曝光、材料微加工及医学手术等领域。ArF准分子激光器不断向着频率更高，功率更大的方向发展。特别是在半导体产业，193nm光刻系统是迄今为止人类所搭建的最为复杂的光学系统之一，随着193nm光刻系统不断向更高的节点迈进，对ArF准分子激光器腔内的薄膜元件的性能及其稳定性的要求愈加苛刻。在ArF准分子激光器中，为了实现极窄的波长输出，需要采用高精度线宽压窄光学模块，该模块中包含了多个用于光斑扩束的色散棱镜。为了获得大倍率光斑扩束，P偏振态ArF准分子激光入射至扩束棱镜斜边表面的入射角通常选定在68o-75o之间。由于大角度入射将引起扩束棱镜斜边表面的菲涅耳反射损耗的剧烈增加。为此，需要在扩束棱镜斜边表面镀制P偏振减反射膜以降低反射损耗。本文针对P偏振光斜入射薄膜系统时的偏振特性进行了理论分析，结合P偏振ArF准分子激光大角度减反射薄膜制备的主要技术难点，采用needle优化算法对其进行了系统的膜系优化设计，并对优化膜系进行了误差评估。深入研究了P偏振大角度减反射薄膜制备工艺优化过程，包括超光滑基底的表征与选取、沉积工艺参数对薄膜材料性能的影响进行了详细的分析与表征。对制备的P偏振大角度减反射薄膜元件进行了相关测试及实验，系统表征了ArF准分子激光大角度减反射薄膜的残余反射率、透过率、角度容差等光谱特征，吸收及散射损耗特性，激光辐照稳定性和时间稳定性等各项性能指标，完备评估了P偏振大角度减反射薄膜的综合质量。在国内首次实现了中心入射角度分别为71o和74o两类P偏振ArF准分子激光大角度减反射薄膜的制备，其性能指标同比达到国际顶级光学薄膜元件公司(美国Acton，日本Sigma等)的报道水平。
[Abstract]:ArF excimer laser is more and more applied to semiconductor exposure because of its high power, high uniformity and high stability. The.ArF excimer laser in the fields of material micromachining and medical surgery has been developing in the direction of higher frequency and greater power. Especially in the semiconductor industry, the 193nm photolithography system is up to now. As one of the most complex optical systems built, the performance and stability of the thin film elements in the ArF excimer laser are increasingly demanding as the 193nm lithography system continues to move towards higher nodes.
In the ArF excimer laser, in order to achieve very narrow wavelength output, a high-precision line width narrowing optical module is required. In this module, multiple dispersive prisms are included in the beam beam expansion. In order to obtain large magnification, the incident angle of the P polarization ArF excimer laser to the beveled edge surface of the beam expanding prism is usually selected in the 68o-75o In the case of large angle incident, the Fresnel reflection loss of the beveled surface of the beam expanding prism will be increased violently. Therefore, the P polarization reduction film should be plated on the bevel edge surface of the beam expanding prism to reduce the reflection loss.
In this paper, the polarization characteristics of the P polarized light oblique incidence film system are analyzed, and the main technical difficulties of the P polarizing ArF excimer laser large angle reduction film are studied. The optimized design of the film system is carried out by the needle optimization algorithm, and the error of the optimized film system is evaluated. The polarization of the P is deeply studied. The optimization process of the fabrication process of the angle reduction film, including the characterization and selection of the super smooth substrate, the influence of the deposition process parameters on the properties of the thin film materials, was analyzed and characterized. The related tests and experiments were carried out on the prepared P polarizing large angle reduction film elements, and the large angle reduction of the ArF excimer laser was systematically characterized. The residual reflectance, transmittance, angular tolerance and other spectral characteristics, absorption and scattering loss characteristics, laser irradiation stability and time stability, etc., are used to evaluate the comprehensive quality of the P polarizing large angle antireflection film.
For the first time, 71o and 74o two kinds of P polarizing ArF excimer laser large angle reduction films were prepared for the first time in China, and their performance indexes reached the level of international top optical thin film companies (Acton, Japan Sigma, etc.).
【学位授予单位】：中国科学院研究生院(长春光学精密机械与物理研究所)
【学位级别】：博士
【学位授予年份】：2014
【分类号】：O484;O436.3

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