超声振动辅助激光辐照FTO基透明导电薄膜的研究

发布时间：2018-07-05 07:02

本文选题：FTO薄膜 + Ag/FTO薄膜　；参考：《江苏大学》2017年硕士论文

【摘要】：掺氟二氧化锡(FTO)透明导电薄膜具有无毒、易于激光刻蚀、抗酸碱且可实现大面积生产等优点,应用前景广泛。随着光电器件产业的快速发展,高性能且低成本薄膜材料的需求也在逐渐提高,因此许多研究者提出运用激光辐照的方法来提高薄膜性能以满足实际应用需求。现有关于激光辐照的研究主要集中于激光器种类的选择和激光参数的优化,而针对采用超声振动辅助激光处理FTO改善薄膜性能的研究鲜有报道。基于此,本文提出在激光辐照FTO基薄膜的过程中引入超声振动,着重研究了超声振动与激光辐照的耦合作用对薄膜的影响,并获得了有意义的研究结果。1、采用超声振动辅助激光退火处理FTO薄膜,考察了激光能量密度和振动功率对薄膜结构、形貌和性能的影响,同时探讨了超声振动辅助激光退火作用机理。实验发现,在激光退火过程中引入超声振动可使薄膜随着超声波换能器一起沿法线方向发生周期性上下位移而引起激光聚焦状况发生连续变化,保证薄膜处于最佳退火范围内,同时还可使薄膜表面激光熔融区域的颗粒被振动分散,由此抑制颗粒间的团簇现象,最终提高薄膜表面的均匀性、致密度和平整度,并降低薄膜的厚度和表面粗糙度。结果表明,在0.6 J/cm~2的激光能量密度和300 W的振动功率下,薄膜表面颗粒的均匀性、致密度和平整度最佳,此时在400~800 nm波段的平均透光率为84.7%,方块电阻为9.0Ω/sq,品质因子为2.11×10~(-2)Ω~(-1),相比未处理FTO薄膜(1.13×10~(-2)Ω~(-1))明显提高。2、采用直流磁控溅射法在FTO薄膜表面沉积不同厚度的Ag层,再采用超声振动辅助激光退火处理Ag/FTO薄膜,考察了Ag层厚度以及光斑重叠率(SOR)和扫描线重叠率(LOR)对薄膜的结构、形貌和性能的影响。结果表明,在5 nm的Ag层厚度下,当SOR和LOR分别为90%和80%时,薄膜的表面颗粒最为均匀、致密,此时综合光电性能最佳,平均透光率为81.8%,方块电阻为6.3Ω/sq,品质因子为2.16×10~(-2)Ω~(-1),与超声振动辅助激光退火处理单层FTO薄膜相比,其导电性显著提升,但透光性略有降低。3、采用超声振动辅助激光织构化处理Ag/FTO薄膜,研究了超声振动对薄膜表面光栅结构形成的影响。实验发现,超声振动的引入可使激光激发的Ag颗粒表面等离子体波作周期性微小变化,从而更易与入射激光发生干涉,同时可使激光辐照区域的薄膜材料分布得更为均匀,确保形成完整、规则且均匀的光栅结构。结果表明,在0.6 J/cm~2的激光能量密度下,薄膜的平均透光率为85.5%,方块电阻为6.4Ω/sq,品质因子为3.26×10~(-2)Ω~(-1),与超声振动辅助激光退火处理Ag/FTO薄膜相比,综合光电性能提升显著。
[Abstract]:Fluorine-doped tin dioxide (FTO) transparent conductive thin films have the advantages of non-toxic, easy to be etched by laser, anti-acid and alkali-resistant, and can be used in a wide range of applications. With the rapid development of optoelectronic device industry, the demand for high performance and low cost thin film materials is increasing gradually. Therefore, many researchers have proposed the method of laser irradiation to improve the film performance to meet the practical application needs. The current researches on laser irradiation mainly focus on the selection of laser types and optimization of laser parameters, but there are few reports on improving the performance of thin films by ultrasonic vibration assisted laser treatment of FTO. In this paper, ultrasonic vibration is introduced in the process of laser irradiation on FTO based thin films, and the effect of coupling of ultrasonic vibration and laser irradiation on the films is studied. Significant results were obtained. 1. The effects of laser energy density and vibration power on the structure, morphology and properties of FTO thin films were investigated by ultrasonic vibration assisted laser annealing. The mechanism of ultrasonic vibration assisted laser annealing is also discussed. It is found that the ultrasonic vibration during laser annealing can make the film move up and down periodically along the normal direction with the ultrasonic transducer and cause the continuous change of the laser focusing state, which ensures that the film is in the best annealing range. At the same time, the particles in the laser melting region on the film surface can be vibrated and dispersed, which can suppress the cluster phenomenon between the particles, improve the uniformity, density and smoothness of the film surface, and reduce the thickness and surface roughness of the film. The results show that at the laser energy density of 0.6 J / cm ~ (2) and the vibration power of 300 W, the uniformity, density and smoothness of the particles on the surface of the film are the best. The average transmittance at 800 nm is 84.7, the square resistance is 9.0 惟 / sqand the quality factor is 2.11 脳 10 ~ (-2) 惟 ~ (-1). Compared with the untreated FTO film (1.13 脳 10 ~ (-2) 惟 ~ (-1), the Ag layer with different thickness is deposited on the surface of FTO film by DC magnetron sputtering. The effects of Ag layer thickness, spot overlap ratio (sor) and scanning line overlap ratio (LOR) on the structure, morphology and properties of Ag- / FTO thin films were investigated by ultrasonic vibration assisted laser annealing. The results show that when sor and LOR are 90% and 80% respectively, the surface particles of the films are the most uniform and compact at the Ag thickness of 5 nm, and the comprehensive optoelectronic properties are the best. The average transmittance is 81.8, the square resistance is 6.3 惟 / sqand the quality factor is 2.16 脳 10 ~ (-2) 惟 ~ (-1). Compared with the single-layer FTO film treated by ultrasonic vibration assisted laser annealing, its electrical conductivity is significantly improved, but the transmittance is slightly decreased by 0.3. The influence of ultrasonic vibration on the formation of grating structure on the surface of thin film was studied. It is found that the introduction of ultrasonic vibration can make the surface plasma waves of Ag particles excited by laser make periodic small changes, thus it is easier to interfere with the incident laser, and at the same time, the film materials in the region irradiated by laser can be distributed more evenly. Ensure a complete, regular and uniform grating structure. The results show that the average transmittance, square resistance and quality factor are 85.5, 6.4 惟 / sqand 3.26 脳 10 ~ (-2) 惟 ~ (-1) at 0.6 J / cm ~ 2 laser energy density.
【学位授予单位】：江苏大学
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：TB383.2

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