双氧水对溶胶-凝胶法制备硅酸锆薄膜的影响

发布时间：2018-09-08 07:36

【摘要】：以氧氯化锆和正硅酸乙酯为锆源和硅源,采用溶胶-凝胶法制备硅酸锆薄膜。借助SEM、DTA-TG、FT-IR、XRD等分析测试手段研究了添加双氧水(H_2O_2)对制备硅酸锆薄膜的影响,并研究了薄膜的抗腐蚀性能。结果表明:适量的双氧水可以有效地促进氧氯化锆的水解,进而克服薄膜高温失重造成孔洞和致密性差的问题;当H_2O_2/Zr的摩尔比小于2时,制备的薄膜不致密、不均匀;当H_2O_2/Zr的摩尔比大于2时,制备的样品有杂质相;最优的H_2O_2/Zr摩尔比为2,可制得均匀、致密的硅酸锆薄膜;所制备的薄膜具有较好的抗NaOH溶液腐蚀性能,单晶硅基片腐蚀前后质量损失为16.92%,而镀有硅酸锆薄膜的单晶硅基片腐蚀前后质量损失仅为0.56%。
[Abstract]:Zirconium silicate thin films were prepared by sol-gel method using zirconium oxychloride and ethyl orthosilicate as zirconium and silicon sources. The effect of adding hydrogen peroxide (H_2O_2) on the preparation of zirconium silicate thin films was studied by means of SEM,DTA-TG,FT-IR,XRD and the corrosion resistance of the films was studied. The results show that proper amount of hydrogen peroxide can effectively promote the hydrolysis of zirconium oxychloride and overcome the problems of poor porosity and densification caused by high temperature weightlessness of the films, and the films prepared are not compact and uniform when the molar ratio of H_2O_2/Zr is less than 2. When the molar ratio of H_2O_2/Zr is more than 2, the samples prepared have impurity phase, the optimal molar ratio of H_2O_2/Zr is 2, and the homogeneous and dense zirconium silicate thin films can be prepared. The prepared films have good corrosion resistance to NaOH solution. The mass loss of monocrystalline silicon substrate before and after corrosion is 16.92, while that of monocrystalline silicon substrate coated with zirconium silicate film is only 0.56 before and after corrosion.
【作者单位】：景德镇陶瓷大学材料科学与工程学院;国家日用及建筑陶瓷工程技术研究中心;
【基金】：国家自然科学基金(51362014,51662016,51402135) 江西省优势科技创新团队建设计划(20133BCB24010) 江西省教育厅基金(GJJ150887,GJJ150919)
【分类号】：TQ134.12;TB383.2

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