电感耦合式射频等离子清洗系统设计研制
发布时间：2018-09-14 09:56
【摘要】：本文主要介绍了电感耦合式射频等离子清洗设备的研制和实验,电感耦合式等离子是等离子应用后期出现的新型方式,除了具有等离子清洗的诸多优点外,其外电极结构有效避免了电极造成的二次污染,是一种高效、高洁净的清洗方法。电感耦合式等离子离子能量高、分布均匀,并且很容易实现外电极结构,彻底解决了电极在真空室内发生二次溅射的问题,是极具研究价值和应用潜力的新型干法清洗技术和设备。电感耦合式射频等离子清洗系统的研制需求是军用微波真空电子器件领域提出的,在电真空器件小型化、高可靠发展趋势的推动下,制造工艺面临着改进和革新,现有的湿法清洗工艺已无法完全满足器件研制需求,传统的电容耦合式清洗机也因结构问题不适用于高洁净清洗,开展电感耦合式射频等离子清洗技术和应用研究非常必要和迫切。本文主要研究了等离子体产生的方式、射频等离子体的特性和等离子清洗的机理。等离子产生方式有很多种,不同的产生方式等离子的特性不同,应用也不同。射频等离子体的特性决定了其在工业清洗中的应用优势,理论研究为电感耦合式等离子清洗系统研制奠定了基础。介绍了电感耦合式等离子清洗系统的研制过程,对设备的主要组成、机械设计过程、电气控制系统设计过程等进行了详细的介绍,并着重介绍了研制中的难点和创新点。最后,本文对研究工作中的成绩和不足进行了总结,指出了下一步研究的方向和内容。
[Abstract]:This paper mainly introduces the development and experiment of inductively coupled RF plasma cleaning equipment. The structure of the external electrode effectively avoids the secondary pollution caused by the electrode and is an efficient and highly clean cleaning method. The inductively coupled plasma has high energy and uniform distribution, and it is easy to realize the structure of the external electrode, which solves the problem of the electrode sputter in the vacuum chamber. It is a new dry cleaning technology and equipment with great research value and application potential. The development requirement of inductively coupled RF plasma cleaning system is put forward in the field of military microwave vacuum electronic devices. With the promotion of miniaturization and high reliability of electric vacuum devices, the manufacturing process is facing improvement and innovation. The existing wet cleaning process can not fully meet the needs of device development, and the traditional capacitive coupled cleaning machine is not suitable for high clean cleaning due to structural problems. It is necessary and urgent to develop inductively coupled RF plasma cleaning technology and its application. In this paper, the way of plasma generation, the characteristics of RF plasma and the mechanism of plasma cleaning are studied. There are many kinds of plasma generation methods. The characteristics and applications of plasma are different. The characteristics of RF plasma determine its application advantage in industrial cleaning. The theoretical research lays a foundation for the development of inductively coupled plasma cleaning system. This paper introduces the development process of inductively coupled plasma cleaning system, introduces in detail the main components of the equipment, the process of mechanical design and the design process of electrical control system, and emphatically introduces the difficulties and innovations in the development. Finally, this paper summarizes the achievements and shortcomings of the research, and points out the direction and content of the next research.
【学位授予单位】：电子科技大学
【学位级别】：硕士
【学位授予年份】：2014
【分类号】：O539;TB490
本文编号：2242378
[Abstract]:This paper mainly introduces the development and experiment of inductively coupled RF plasma cleaning equipment. The structure of the external electrode effectively avoids the secondary pollution caused by the electrode and is an efficient and highly clean cleaning method. The inductively coupled plasma has high energy and uniform distribution, and it is easy to realize the structure of the external electrode, which solves the problem of the electrode sputter in the vacuum chamber. It is a new dry cleaning technology and equipment with great research value and application potential. The development requirement of inductively coupled RF plasma cleaning system is put forward in the field of military microwave vacuum electronic devices. With the promotion of miniaturization and high reliability of electric vacuum devices, the manufacturing process is facing improvement and innovation. The existing wet cleaning process can not fully meet the needs of device development, and the traditional capacitive coupled cleaning machine is not suitable for high clean cleaning due to structural problems. It is necessary and urgent to develop inductively coupled RF plasma cleaning technology and its application. In this paper, the way of plasma generation, the characteristics of RF plasma and the mechanism of plasma cleaning are studied. There are many kinds of plasma generation methods. The characteristics and applications of plasma are different. The characteristics of RF plasma determine its application advantage in industrial cleaning. The theoretical research lays a foundation for the development of inductively coupled plasma cleaning system. This paper introduces the development process of inductively coupled plasma cleaning system, introduces in detail the main components of the equipment, the process of mechanical design and the design process of electrical control system, and emphatically introduces the difficulties and innovations in the development. Finally, this paper summarizes the achievements and shortcomings of the research, and points out the direction and content of the next research.
【学位授予单位】：电子科技大学
【学位级别】：硕士
【学位授予年份】：2014
【分类号】：O539;TB490
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