双波段截止分色滤光片研究
发布时间:2018-11-12 11:43
【摘要】:为实现45°入射情况下K9基底上双波段截止分色的特性(截止带波长0.5~0.68μm、0.73~0.79μm,通带波长0.83~0.87μm),采用F-P型的带通滤光片膜系结构为初始结构,与常规设计理念相比有效减少了膜层的数量,薄膜的高折材料采用Ti O2,低折材料采用Si O2,以实现双波段截止的目的。膜层的设计层数为23层,总厚度为2.278μm,借助电子束蒸发物理气相沉积法实现了镀制,利用分光光度计对镀制样品的透过率进行评估。测试结果显示,截止区(0.5~0.68μm和0.73~0.79μm)平均截止深度分别达到了12.57%和20.39%,通带0.83~0.87μm波段内的平均透过率达到了91.35%,样品测试曲线与设计相比,"蓝移"将近10 nm。薄膜样品基本实现了设计目标,具有双波段截止、高通带透过率的特性。在环境测试中:薄膜表现出显著的稳定性,膜层间匹配度适宜。该双波段截止分色滤光片能够应用在一些极端的情况下。
[Abstract]:In order to realize the characteristics of double band cutoff color separation on K9 substrate at 45 掳incidence (cut-off band wavelength 0.5 ~ 0.68 渭 m ~ 0.73 ~ 0.79 渭 m, passband wavelength 0.83 ~ 0.87 渭 m), F-P type bandpass filter membrane system was used as the initial structure. Compared with the conventional design concept, the number of film layers is reduced effectively. Ti O _ 2 is used as the high refractive material and Si O _ 2 is used as the low refractive material in order to achieve the purpose of double band cut-off. The designed layer is 23 layers and the total thickness is 2.278 渭 m. By means of electron beam evaporation physical vapor deposition, the transmittance of the deposited samples is evaluated by spectrophotometer. The results show that the average cutoff depth in the cutoff region (0.5 ~ 0.68 渭 m and 0.73 ~ 0.79 渭 m) is 12.57% and 20.39%, respectively, and the average transmittance in the band of 0.83 ~ 0.87 渭 m is 91.35 渭 m, and the average cut-off depth of 0.73 渭 m and 0.73 渭 m are 12.57% and 20.39 渭 m, respectively. Compared with the design, the "blue shift" of the sample test curve is nearly 10 nm.. The thin film samples have achieved the design goal and have the characteristics of double band cutoff and high pass band transmittance. In the environmental test, the film shows remarkable stability and suitable matching degree between layers. The dual band cutoff color separation filter can be used in some extreme cases.
【作者单位】: 江南大学理学院江苏省轻工光电工程技术研究中心;
【基金】:上海市全固态激光器与应用技术重点实验室开放课题(2012ADL03) 国家自然科学基金(60908041) 江苏省研究生创新项目(SJLX16_0492)资助~~
【分类号】:O484.41
本文编号:2327016
[Abstract]:In order to realize the characteristics of double band cutoff color separation on K9 substrate at 45 掳incidence (cut-off band wavelength 0.5 ~ 0.68 渭 m ~ 0.73 ~ 0.79 渭 m, passband wavelength 0.83 ~ 0.87 渭 m), F-P type bandpass filter membrane system was used as the initial structure. Compared with the conventional design concept, the number of film layers is reduced effectively. Ti O _ 2 is used as the high refractive material and Si O _ 2 is used as the low refractive material in order to achieve the purpose of double band cut-off. The designed layer is 23 layers and the total thickness is 2.278 渭 m. By means of electron beam evaporation physical vapor deposition, the transmittance of the deposited samples is evaluated by spectrophotometer. The results show that the average cutoff depth in the cutoff region (0.5 ~ 0.68 渭 m and 0.73 ~ 0.79 渭 m) is 12.57% and 20.39%, respectively, and the average transmittance in the band of 0.83 ~ 0.87 渭 m is 91.35 渭 m, and the average cut-off depth of 0.73 渭 m and 0.73 渭 m are 12.57% and 20.39 渭 m, respectively. Compared with the design, the "blue shift" of the sample test curve is nearly 10 nm.. The thin film samples have achieved the design goal and have the characteristics of double band cutoff and high pass band transmittance. In the environmental test, the film shows remarkable stability and suitable matching degree between layers. The dual band cutoff color separation filter can be used in some extreme cases.
【作者单位】: 江南大学理学院江苏省轻工光电工程技术研究中心;
【基金】:上海市全固态激光器与应用技术重点实验室开放课题(2012ADL03) 国家自然科学基金(60908041) 江苏省研究生创新项目(SJLX16_0492)资助~~
【分类号】:O484.41
【相似文献】
相关期刊论文 前7条
1 刘胜永;;华北光电所研制成功宽光谱带分色滤光片[J];激光与红外;1979年05期
2 李恒义;李琼瑞;;0.4~1.1微米高透、3~15微米高反的宽光谱带分色滤光片的设计[J];激光与红外;1979年10期
3 激光与红外通讯员;;华北光电所四项科研成果鉴定会在北京召开[J];激光与红外;1979年11期
4 杨洁;付秀华;张静;;可见与远红外分色滤光片的研制[J];激光与红外;2011年02期
5 刘敬海,徐荣甫;背景对目标双波段辐射比影响的研究[J];北京理工大学学报;1998年05期
6 苏现军;徐岩;司俊杰;;双波段宽带减反膜的研究[J];光学技术;2007年04期
7 孙强,卢振武,王肇圻;谐衍射/折射双波段系统设计[J];光学学报;2004年06期
相关会议论文 前1条
1 何光宗;熊长新;李钱陶;吴小丽;;一种锗基底红外双波段保护膜[A];中国光学学会2010年光学大会论文集[C];2010年
,本文编号:2327016
本文链接:https://www.wllwen.com/guanlilunwen/gongchengguanli/2327016.html