面向特征建模方式的微器件工艺方法研究

发布时间：2018-04-25 17:39

本文选题：表面微加工 + MEMS　；参考：《西安工业大学》2017年硕士论文

【摘要】：微型元器件是微机电系统中的重要组成部分,并且在多种行业内得到了非常广泛的应用,因此微器件的工艺设计方法就显得至关重要。目前,微型元器件设计者在设计微器件的同时还需要掌握微器件的加工工艺,这样就使得微器件的开发周期变长、设计效率低下。要求微器件的功能设计者同时需要掌握大量工艺知识。伴随着设计理念的发展,产生了更为先进的“逆向”设计方法,即先创建MEMS器件的结构模型,再由模型推导出工艺信息,其关键就在于微器件的工艺分层和掩模的推导。为了从基础技术层面支撑这种设计思想,论文以微器件的三维模型为基础,利用有向图方法完成对三维模型的工艺分层,再基于MUMPS工艺规范,开发了掩模推导算法,利用该算法实现了各工艺层的掩模推导。在VC++环境下通过MFC框架,利用三维内核Open CASCADE搭建了应用程序。然后以典型微器件为实例,在构建的三维环境下完成微器件的建模与显示。以微器件的特征模型为输入,利用有向图搜索配合交互判断的方法完成对特征的工艺分层。以各个工艺层为单位,运用几何元素和模型运算相结合的掩模推导算法,在三维系统中完成掩模的推导,得到每一工艺层对应的掩模版图,实现了掩模的自动生成。最后,在本课题所开发的原型系统下完成了对文中所提相关方法的验证,为微器件先进设计理念做出了技术层面的支撑。
[Abstract]:Micro component is an important part of MEMS, and has been widely used in many industries, so the process design method of micro device is very important. At present, the designers of microdevices need to master the fabrication technology of microdevices while designing microdevices, which makes the development period of microdevices become longer and the design efficiency is low. The functional designers of microdevices are required to master a great deal of process knowledge at the same time. With the development of the design concept, a more advanced "reverse" design method has emerged, that is, the structure model of MEMS device is first created, and then the process information is derived from the model. The key lies in the process stratification and the derivation of mask. In order to support this design idea from the basic technical level, based on the 3D model of microdevices, the process stratification of the 3D model is accomplished by using the directed graph method, and the mask derivation algorithm is developed based on the MUMPS process specification. The mask derivation of each process layer is realized by using this algorithm. In VC environment, the application program is built by using MFC framework and 3 D kernel Open CASCADE. Then, the modeling and display of the microdevices are completed in a 3D environment with typical microdevices as an example. Based on the feature model of the microdevice, the process layer of the feature is completed by searching the digraph with the interactive judgment method. Taking each process layer as a unit, the mask derivation algorithm combining geometric elements and model operation is used to complete the derivation of the mask in the 3D system, and the mask map corresponding to each process layer is obtained, which realizes the automatic generation of the mask. Finally, the prototype system developed in this paper has completed the verification of the related methods proposed in this paper, which provides a technical support for the advanced design concept of microdevices.
【学位授予单位】：西安工业大学
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：TH-39

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