聚合物表面类金刚石膜的制备及其阻隔性研究
本文选题:类金刚石膜 + 等离子体增强化学气相沉积 ; 参考:《浙江大学》2017年硕士论文
【摘要】:类金刚石(diamond-like carbon,DLC)薄膜具有高硬度、高弹性模量、优异的减摩耐磨性能、良好的光透过性、较强的化学稳定性和生物相容性等优异的性能,在太空机械、加工模具、汽车、电子器件、光学、生物医学等领域拥有广阔的应用前景。本文采用等离子体增强化学气相沉积技术(PECVD)在聚对苯二甲酸乙二酯(PET)和聚丙烯(OPP)薄膜材料表面沉积DLC薄膜来增强薄膜的阻隔性,拟将其应用于包装中以达到代替金属蒸镀、金属氧化物镀膜等材料的目的,同时还改善材料使用安全性及回收性能。论文通过实验探索了 PECVD法在柔性薄膜(PET和OPP)上制备DLC薄膜的可行性,并考察了 PECVD法工艺参数对柔性薄膜上沉积DLC薄膜性能的影响,优化了 PECVD法工艺参数。论文首先在PET和OPP表面采用PECVD法沉积了 DLC膜,工作气体为乙炔和氩气。采用拉曼光谱和SEM研究了表面形貌和DLC膜的内部结构,表面粗糙度通过原子力显微镜分析(AFM),测试了 DLC膜的阻隔性能。结果表明,沉积工艺参数对PET表面的DLC膜生长速率和结构性能有重要影响,纳米金刚石膜主要由sp2和sp3杂化化合物构成,DLC膜越厚,PET薄膜的阻隔性能越好。DLC膜能将PET薄膜的最佳的氧阻隔性能和水蒸气阻隔性能分别提高11倍和近12倍,此时ID/IG比率为0.76。PECVD方法也可以在OPP表明制得致密、均匀和大光滑表面的DLC膜,AFM结果表明,PECVD是OPP表面上沉积均匀光滑DLC膜的可靠方法。当射频功率从200W增加到1000W时,表面粗糙度均方根(RMS)从2.149nm降低到0.989nm,表面粗糙度(Ra)从1.622nm降低到0.776nm。与未处理的OPP膜相比,处理过的OPP的阻隔性能明显改善。当DLC膜以射频功率1000W,Ar:C2H2=1:2,沉积时间60s和沉积压力15Pa沉积时,OPP膜的最佳氧气和二氧化碳阻隔性能分别提高7倍和4倍,其中DLC膜的ID/IG比接近0.396,DLC 膜的厚度为 17.9nm。
[Abstract]:Diamond-like carbon DLCL films have excellent properties such as high hardness, high modulus of elasticity, excellent antifriction and wear resistance, good light transmission, strong chemical stability and biocompatibility, etc., in space machinery, processing dies, automobiles, etc. Electronic devices, optics, biomedicine and other fields have a broad application prospects. In this paper, plasma enhanced chemical vapor deposition (PECVD) was used to prepare DLC films on the surface of poly (ethylene terephthalate) (PET) and polypropylene (PP) films to enhance the barrier of the films. The purpose of metal oxide coating is to improve the safety and recovery of materials. In this paper, the feasibility of preparing DLC thin films on flexible films by PECVD method was investigated experimentally, and the effect of PECVD process parameters on the properties of DLC films deposited on flexible films was investigated. The process parameters of PECVD method were optimized. Firstly, DLC films were deposited on the surface of PET and OPP by PECVD method. The working gases were acetylene and argon. The surface morphology and internal structure of DLC films were investigated by Raman spectroscopy and SEM. The barrier properties of DLC films were measured by atomic force microscopy (AFM). The results show that the deposition process parameters have an important effect on the growth rate and structure properties of DLC film on PET surface. The thicker the sp2 film is, the better the barrier property is. DLC film can improve the best oxygen barrier performance and water vapor barrier performance of PET film by 11 times and nearly 12 times, respectively. At this time, the ID/IG ratio of 0.76.PECVD method can also be obtained on the OPP densified, uniform and large smooth surface DLC films. The results show that the DLC film on the OPP surface is a reliable method for the deposition of homogeneous and smooth DLC films. When the RF power is increased from 200W to 1000W, the RMS of surface roughness decreases from 2.149nm to 0.989 nm, and the surface roughness Rafrom 1.622nm to 0.776 nm. Compared with the untreated OPP film, the barrier performance of the treated OPP was improved obviously. The optimum oxygen and carbon dioxide barrier properties of DLC films were increased by 7 times and 4 times respectively when the deposition time was 60 s and the deposition pressure was 15Pa when the radio frequency power was 1 000 W: C 2H 2 1: 2. The thickness of DLC film was 17.9 nm compared with that of DLC film close to 0.396nm.
【学位授予单位】:浙江大学
【学位级别】:硕士
【学位授予年份】:2017
【分类号】:TB383.2
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