超薄晶硅太阳能电池的研究

发布时间：2019-01-26 10:07

【摘要】：随着人类的进步与社会的发展,开发和使用各种清洁能源已成为一种趋势。近年来,光伏产业发展迅速,已出现多种形式的太阳能电池。尽管每种电池均具有各自的优缺点,但实用化的太阳电池仍以晶硅太阳电池为主。目前,晶硅电池主要面临两方面的问题,即成本偏高和效率偏低。解决成本偏高问题,需要降低铸锭、工艺加工和组件封装过程中的材料成本。采用超薄晶片制作电池可有效节约晶硅电池的材料成本。目前,研究人员已制备出多种成品超薄晶硅太阳能电池,如:在冶金级衬底上实现了效率为9.75%(晶片厚度为25-30?m)的超薄晶硅太阳能电池;在钢衬底上实现了效率为9.5%(晶片厚度为20?m)超薄晶硅太阳电池。根据已有的研究结果,不难看出现有超薄晶硅电池效率较低。为提高超薄晶硅电池效率,研究人员提出多种超薄晶硅太阳能电池增效技术,其中具有代表性的增效技术包括:光子晶体背反射技术,即在超薄晶硅太阳能电池底部设计背反射结构,增加长波光子吸收;在超薄晶硅太阳能电池上下表面采用光栅陷光结构,增加电池光吸收;在超薄晶硅太阳能电池表面采用纳米织构增加电池的光吸收能力;开发一些适合超薄晶硅太阳能电池新型的表面钝化材料和钝化层制备技术。由于超薄晶硅电池具有明显降低晶硅材料成本的优势,其借助于多项电池增效技术的应用,有望成为解决晶硅电池基本问题的有效途径,所以超薄晶硅电池研究已成为近年来光伏领域研究的热点。本文借助理论分析与实验研究相结合的方法,研究了超薄晶硅太阳能电池制备过程中的工艺参数、中间过程中参数测试和理论仿真。超薄晶硅片的制备过程中采用碱腐蚀减薄的方法,主要分析在超薄晶硅片制备过程中的少子寿命变化和施主型杂质对晶硅少子衰减过程的影响。也对超薄晶硅电池的结构参数进行了理论仿真和优化,包括超薄晶硅太阳能电池上表面减反射膜优化、织构结构优化及金属背反镜的吸收损耗研究。在对超薄晶硅太阳电池背反镜的吸收损耗的研究中,采用二维频域有限差分法(FDFD)。还分析和研究了超薄晶硅电池制备工艺及其参数测试,包括制备超薄晶硅太阳能电池工艺流程,超薄晶硅太阳电池结深与表面杂质浓度的测试,超薄晶硅太阳电池I-V特性测试与分析等。其中超薄晶硅太阳电池金属电极的制备与传统晶硅电池金属电极制备有不同之处,并分析了不同之处的优势。
[Abstract]:With the progress of human beings and the development of society, it has become a trend to develop and use all kinds of clean energy. In recent years, photovoltaic industry has developed rapidly, and many forms of solar cells have emerged. Although each kind of solar cell has its own advantages and disadvantages, the practical solar cells are still mainly crystalline silicon solar cells. At present, the silicon battery mainly faces two problems, that is, high cost and low efficiency. To solve the problem of high cost, we need to reduce the cost of materials in ingot, process and package process. The material cost of silicon battery can be effectively saved by using ultrathin wafer to make battery. At present, many kinds of ultra-thin crystalline silicon solar cells have been fabricated, such as: the ultra-thin silicon solar cells with an efficiency of 9.75% (wafer thickness 25-30 m) have been realized on metallurgical substrates; An ultra-thin silicon solar cell with an efficiency of 9.5% (wafer thickness of 20 m) was realized on steel substrate. According to the existing research results, it is not difficult to see that the existing ultra-thin silicon cell efficiency is low. In order to improve the efficiency of ultra-thin crystalline silicon cells, researchers have proposed a variety of ultra-thin silicon solar cell synergy technology, including the representative of the efficiency of the photonic crystal backreflection technology, The backreflection structure is designed at the bottom of the ultra-thin silicon solar cell to increase the long-wave photon absorption. Grating trapping structure is used on the upper and lower surfaces of ultra-thin crystalline silicon solar cells to increase the light absorption of the cells, and nanocrystalline texture is used on the surface of ultra-thin crystalline silicon solar cells to increase the light absorption capacity of the cells. Some new surface passivating materials and passivating layer preparation techniques are developed for ultra-thin silicon solar cells. Because the ultra-thin crystal silicon battery has the advantage of reducing the cost of crystal silicon material obviously, it is expected to become an effective way to solve the basic problem of crystal silicon battery with the aid of the application of several battery synergistic technologies. Therefore, the research of ultrathin crystalline silicon cells has become a hot spot in the field of photovoltaic in recent years. By combining theoretical analysis with experimental research, the process parameters of ultra-thin silicon solar cells are studied in this paper. The parameters are measured and simulated in the intermediate process. In the preparation of ultrathin silicon wafer, alkali corrosion thinning method is used to analyze the variation of minority carrier lifetime and the effect of donor impurity on the decay process of crystal silicon minority carrier during the preparation of ultrathin silicon wafer. The theoretical simulation and optimization of the structural parameters of ultra-thin crystalline silicon cell are also carried out, including the optimization of antireflection film on the surface of ultra-thin silicon solar cell, the optimization of texture structure and the study of absorption loss of metal back mirror. In the study of absorption loss of the back mirror of ultra-thin silicon solar cells, a two-dimensional finite difference method in frequency domain (FDFD).) is used. The preparation process and parameters of ultra-thin crystalline silicon cell were also analyzed and studied, including the fabrication process of ultra-thin crystalline silicon solar cell, the junction depth and surface impurity concentration of ultra-thin crystalline silicon solar cell. Measurement and analysis of I-V characteristics of ultrathin silicon solar cells. The preparation of ultrathin silicon solar cell metal electrode is different from that of traditional crystal silicon solar cell, and its advantages are analyzed.
【学位授予单位】：渤海大学
【学位级别】：硕士
【学位授予年份】：2016
【分类号】：TM914.41

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