光学投影式光刻系统中套刻对准方法研究

发布时间：2018-03-23 09:44

本文选题：投影式光刻系统　切入点：套刻对准　出处：《广东工业大学》2015年硕士论文　论文类型：学位论文

【摘要】：随着信息化产业的快速发展,光刻技术已经成为制约超大规模集成电路以及微光学元器件制作的核心技术。光学曝光光刻技术经历了接触式光刻、接近式光刻、光学投影式光刻及激光干涉光刻等典型光刻技术进程。由于光学投影式光刻在技术成熟性以及设备稳定性方面优势明显,目前市场广泛应用的还是投影式曝光光刻技术。作为光刻技术的承载平台,同时扮演现代半导体工业与电子技术工业孵化器角色的光学投影式光刻系统,其主要组成部分包括曝光光源、光刻投影物镜、掩膜硅片对准系统、激光定位工作台。针对实验室现有的准分子激光投影光刻机系统,本文就其中的掩膜硅片对准系统、曝光光源两个部分展开了相关研究工作。在本文中,第一章综述了课题的背景,光刻系统的分类,国内外研究现状,课题研究的目的与意义,以及本论文主要研究内容。第二章详细介绍了整个投影光刻套刻技术理论,对准技术及其分类,以及影响光刻机系统的各主要因素,分析了各主要对准方法的优缺点。针对目前套刻对准技术发展的现状,在第三章中我们针对高精度的投影套刻对位系统,研究并提出了一种新型的对准与匹配算法。该算法的核心是一个经严格推导的,国内外未见报道的仿射变换“单应矩阵计算式”,同时利用轮廓线插值特征点匹配的方式来寻求对位参量。首先,利用质心法分别求出掩模图与硅板图相应ROI区域中经过特征点提取后得到的点集质心；然后对点集中各点依据与质心点的欧氏距离的大小有序的方式进行排序；最后根据“单应矩阵计算式”,以直接的单步运算即可高精度求得待对准的旋转平移量,取代传统方法需要收敛迭代的耗时运算过程,实现光刻机实时对位系统的要求。第四章是主要是对相应系统软件进行简要介绍,同时进行相应的算法演示以及实验分析,通过对实验结果图像的分析,结合系统中所选用的光学显微物镜组的实际MTF曲线,对系统的精度以及误差进行评价。实验结果表明该系统具有较高的精度,较强的鲁棒性,可实现实时对位的关键实用需求。在第五章中,介绍了如何在现有紫外准分子激光器基础上获得一个均匀平顶光束的方法,在理论上结合高斯-谢尔模型和部分相干光理论,得到可以产生平顶均匀光束的一组参数。为以后利用现有实验条件,结合所提出的对准系统展开相关光刻的研究工作做好了铺垫。总的说,本论文的创新之处在于依据实际套刻对准系统中的简化数学模型为基本无缩放的仿射变换,并在该仿射变换模型的基础上,利用严格的数学推导,得到一组可以一步求出待求变换参量的单应矩阵计算式,可以避免传统计算方法中求取变换参量需要迭代运算的耗时环节：并在该式的基础上结合数字图像处理相关技术,设计了一套可以实现实时对准功能的软件系统,实现了光学投影式光刻系统中套刻对准技术的关键核心。
[Abstract]:With the rapid development of the information industry, lithography technology has become the core of VLSI and micro optical components made of optical lithography. Through contact lithography, lithography, optical projection lithography and laser interference lithography and other typical lithography process. Because the optical projection lithography in the mature technology and equipment the stability of obvious advantages, is widely used in market or projection lithography. As the bearing platform of lithography technology, optical projection lithography system also plays the role of modern semiconductor industry and electronic technology industry incubator role, the main components including the exposure light source, lithographic mask and wafer alignment, laser positioning according to the laboratory bench. The existing excimer laser projection lithography system, in this paper, the mask of silicon wafer Alignment system, exposure of the two part of the light source in the research work. In this paper, the first chapter reviews the background of the topic, the classification of lithography system, the research status at home and abroad, the research purpose and significance, and the main contents of the thesis. The second chapter introduces the whole projection lithography lithography technology theory, alignment the technology and its classification, and main factors affecting the lithography system, analyzes the advantages and disadvantages of the main alignment method. Aiming at the alignment technology development status, in the third chapter we are aiming at high precision projection lithography alignment system, this paper proposed a new alignment with the core of the matching algorithm. The algorithm is a rigorous derivation of the affine transformation "has not been reported at home and abroad of the homography matrix, the calculation formula of" contour interpolation feature point matching way to seek for a first parameter at the same time. First, using the centroid method calculates the centroid of mask graph and silicon plate map corresponding to ROI region after feature extraction from point set; and then sort the point size of the Euclidean distance of each point and the centroid point according to an orderly manner; finally, according to the "formula" homography matrix in single step operation you can directly obtain high precision rotation and translation to be aligned, to replace the traditional method requires time-consuming iterative computing process, realize the real-time positioning system of the lithography requirements. The fourth chapter is mainly a brief introduction to the corresponding system software, at the same time. The corresponding algorithm demonstration and experimental analysis, through the analysis of the experimental results of image and combined with the system of optical lens practical MTF curve to evaluate the system's accuracy and error. Experimental results show that the system has high precision, strong Shandong Bar, key functional requirements can realize real-time positioning. In the fifth chapter, introduces the method of how to obtain a uniform beam based on the existing UV excimer laser, in theory with Gauss Schell model and theory of partially coherent light, can get a set of parameter's top uniform beam. After using the existing experimental conditions, the research work with the proposed alignment system to start the lithography to pave the way for. In general, the innovation of this paper is on the basis of the actual alignment system for the simplified mathematical model of affine transformation basically no zoom, and based on the affine transformation model, using mathematical deduction strictly, a group can be a step for the unknown parameters of the homography matrix transform formula can avoid calculating transformation parameter iterative algorithms, time-consuming traditional calculation methods and links: Based on this formula, combined with the technology of digital image processing, a set of software system that can achieve real-time alignment function is designed, and the core of alignment technology in optical projection lithography system is realized.

【学位授予单位】：广东工业大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7

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