浸液温度控制建模与算法实现

发布时间：2018-05-05 23:36

  本文选题：高精度温控算法 + 温度控制　； 参考：《华中科技大学》2015年硕士论文

【摘要】：浸没式光刻机是目前市场上最主流的高端光刻机,它通过在投影光刻机投影物镜的最后一个镜片与硅片之间充满浸液来提高光刻的焦深和分辨率。浸没式光刻机要求浸液不引入二次污染并且温度具有高精度和高稳定度。为了实现高精度和高稳定度的浸液温度控制,需要建立精确的浸液温控模型和相应的温度控制算法。本文主要研究工作和结论如下:分析了浸液温控的技术需求和相关约束,设计了一种调节冷却水通过热交换器的流量控制浸液温度稳定性的浸液温控原理。该原理中通过引入旁路提升浸液流量、提高温度稳定性,通过支路直接纯水泵增压和流量伺服阀调流方式稳定注液。高精度、高稳定性温度控制具有时滞、多扰动和非线性特征,为此本文提出了一种时滞补偿,扰动抑制的串级控制结构,减小了时滞和环境扰动对温度控制稳定性的影响,并采用“灰色”辨识方法获得了温控系统导前区模型参数、惰性区模型参数和环境扰动模型。基于上述模型提出了浸液温控算法,算法主控制器采用阶梯算法,副控制器采用积分分离PI算法,扰动抑制采用前馈算法,时滞补偿采用史密斯预估算法。基于Simulink对温控算法进行了仿真分析,仿真结果表明:该温控算法能有效补偿时滞,减小超调量,并具有较好的抗干扰能力,提高了浸液温控的稳定性。建立了温控算法验证平台,对浸液温控算法的精度、稳定性、鲁棒性等各方面进行测试。测试数据表明,该浸液温控算法实现了温度稳定度为22,±0.007℃@30mins,满足浸没式光刻机对浸液的性能需求。
[Abstract]:Immersion lithography machine is the most popular high-end lithography machine in the market at present. It can improve the focal depth and resolution of lithography by filling the solution between the last lens of the projection lens and the silicon wafer. Immersion lithography requires no secondary contamination and high temperature accuracy and stability. In order to realize the temperature control of high precision and high stability, it is necessary to establish the accurate temperature control model and the corresponding temperature control algorithm. The main work and conclusions of this paper are as follows: the technical requirements and related constraints of temperature control of leachate are analyzed, and a principle of temperature control is designed to control the temperature stability of leachate by regulating the flow rate of cooling water through heat exchanger. In this principle, the flow rate of immersion is increased by introducing bypass circuit, and the temperature stability is improved. The injection is stabilized by the way of direct pump booster and flow servo valve. The temperature control with high precision and high stability has the characteristics of delay, multi-disturbance and nonlinearity. In this paper, a cascade control structure with time-delay compensation and disturbance suppression is proposed, which reduces the influence of time delay and environmental disturbance on the stability of temperature control. The parameters of the model in front of the temperature control system, the model parameters of the inert zone and the environmental disturbance model are obtained by using the "grey" identification method. Based on the above model, a temperature control algorithm is proposed. The main controller uses step algorithm, the secondary controller adopts integral separation Pi algorithm, the disturbance suppression algorithm adopts feedforward algorithm, and the time-delay compensation adopts Smith prediction algorithm. The temperature control algorithm based on Simulink is simulated and analyzed. The simulation results show that the temperature control algorithm can effectively compensate the time delay, reduce the overshoot, and has better anti-interference ability, and improves the stability of temperature control of immersion liquid. A temperature control algorithm verification platform was established to test the accuracy, stability and robustness of the temperature control algorithm. The test data show that the temperature stability of the dipping solution is 22, 卤0.007 鈩，

本文编号：1849744