静电场辅助的微压印光刻技术

发布时间：2018-06-24 02:04

本文选题：静电场 + 压印　；参考：《光学精密工程》2017年03期

【摘要】：介绍了一种静电场辅助的新型微压印光刻技术,并对其工艺过程进行了深入的理论研究。首先,采用数值仿真软件COMSOL~(TM) Multiphysics,建立了静电场辅助的压印光刻瞬态仿真分析模型,讨论了不同时域微结构的演化过程。然后,详细分析了微结构的成型与仿真实验参数的定性关系,发现:适当地减小极板间距、模板凸起结构周期,同时增加模板的凸起高度、初始聚合物薄膜厚度和电压有助于微纳结构的成型。最后,通过仿真实验参数优化,得到了带有31μm中空结构的球冠微结构。与传统压印方法相比,静电场辅助的微压印技术工艺过程简单且成本较低,能够广泛应用于微电子机械系统、光子学、遗传学和组织系统等。
[Abstract]:A new type of microlithography assisted by electrostatic field is introduced, and its technological process is studied theoretically. Firstly, the transient simulation model of imprint lithography assisted by electrostatic field is established by using the numerical simulation software COMSOL ~ (TM) Multiphysics.The evolution process of different time-domain microstructures is discussed. Then, the qualitative relationship between the shaping of the microstructure and the parameters of the simulation experiment is analyzed in detail. It is found that the distance between the plates is reduced appropriately, the period of the bulge structure of the template is decreased, and the height of the bulge of the template is increased at the same time. The thickness and voltage of the initial polymer film are helpful to the formation of micro-nano structure. Finally, the spherical crown microstructures with 31 渭 m hollow structure are obtained by optimizing the simulation parameters. Compared with traditional imprint technology, electrostatic field assisted microimprint process is simple and low cost, and can be widely used in microelectromechanical systems, photonics, genetics and tissue systems.
【作者单位】：中国科学院长春光学精密机械与物理研究所;中国科学院大学;中国人民解放军63861部队;中国科学院西安光学精密机械研究所;
【基金】：国家自然科学基金资助项目(No.61475156,No.61361166004,No.51275504) 吉林省基金资助项目(No.20140519002JH,No.20140519007JH) 深圳市科创委基金资助项目(No.KQCX2015032416183981)
【分类号】：TN305.7

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