局域表面等离子体纳米光刻原理与方法研究
发布时间：2018-08-10 21:02
【摘要】：局域表面等离子体(Local Surface Plasmon,LSP)纳米光刻技术以简单的系统结构、灵活的刻写方式、无需掩模以及超越衍射极限的分辨力等优势成为纳米光刻技术领域的研究热点。所谓LSP纳米光刻技术,即通过利用长波长光源照明亚波长尺寸的探针或小孔,在探针或者小孔与介质的界面处激发LSP,LSP在探针针尖或者小孔间隙处急剧振荡形成LSP共振,利用表面等离子体(Surface Plasmon,SP)的短波长特性获得超衍射聚焦光斑,并将其应用到超衍射纳米光刻中。然而在基于LSP共振纳米光刻中,由于LSP振荡产生的携带高频信息的倏逝波仅在激发结构的表面传播,在垂直于激发结构表面方向上以指数形式衰减,这就要求在LSP纳米光刻中,激发结构与光学记录介质的距离必须在几个纳米的范围内,而这必然带来距离控制的难题。同时倏逝波在垂直结构表面方向指数衰减的场分布也会导致纳米光刻图形曝光深度浅、对比度低、边缘模糊的问题。这限制了基于LSP纳米光刻技术进一步走向应用。针对这些问题,本论文从研究用于激发LSP的领结型Bowtie结构的电磁场特性与共振行为出发,将Bowtie小孔结构与金属-介质-金属结构相结合,提出了一种基于LSP共振的增强型纳米光刻结构,通过对LSP及其共振行为的操控,得到了深度拓展、尺寸压缩、强度增强的聚焦光斑。本文的主要创新点有:1、研究分析了基于Bowtie小孔的LSP纳米光刻的透射增强原理及光刻质量的影响因素。2、提出一种新型的Bowtie(B)+金属(M)-电介质(I)-金属(M)的增强型纳米光刻结构,并通过理论仿真获得了最小特征宽度为28nm,曝光深度为30nm的聚焦光斑,相对于传统基于Bowtie的光刻结构将焦斑尺寸压缩了近67%。3、开展验证实验,获得了最小特征宽度为31nm的光刻结果,同时相对于传统Bowtie光刻结构,将30nm到100nm特征尺寸范围内的曝光图形深度提升了近5倍。验证了这种增强型光刻结构在压缩焦斑尺寸、提升曝光深度上的显著效果。
[Abstract]:Local Surface Plasma (Local Surface Plasmon LSP (LSP) nanocrystalline lithography technology has become a hotspot in the field of nano-lithography with the advantages of simple system structure, flexible writing method, no mask and resolution beyond the diffraction limit. The so-called LSP nano-lithography technology, which uses a long wavelength light source to illuminate a probe or hole of sub-wavelength size, excites the LSPLSP to oscillate sharply at the tip or pore gap of the probe to form a LSP resonance at the interface between the probe or the pore and the medium. Superdiffractive focusing spot was obtained by using the short wavelength characteristics of Surface Plasmon SP and applied to superdiffractive nanocrystalline lithography. However, in LSP resonance nanocrystalline lithography, evanescent waves with high frequency information produced by LSP oscillation propagate only on the surface of excited structure, and decay exponentially in the direction perpendicular to the surface of excited structure, which requires that in LSP nanocrystalline lithography, The distance between the excitation structure and the optical recording medium must be in the range of several nanometers, which inevitably leads to the difficulty of distance control. At the same time the field distribution of evanescent wave in the direction of exponential attenuation in the vertical surface also leads to the problems of low exposure depth low contrast and blurry edge of nano-lithography. This limits the further application of nanometer lithography based on LSP. In order to solve these problems, the electromagnetic field characteristics and resonance behavior of the bow tie Bowtie structure which is used to excite LSP are studied in this paper. The Bowtie pore structure is combined with the metal-dielectric metal structure. An enhanced nanocrystalline lithography structure based on LSP resonance is proposed. By controlling the LSP and its resonance behavior, the focusing spot with depth expansion, size compression and strength enhancement is obtained. The main innovation of this paper is: 1. The transmission enhancement principle of LSP nanocrystalline lithography based on Bowtie pore and the influencing factors of lithography quality are analyzed. A new type of Bowtie (B) metal (M) dielectric (I) metal (M) enhanced nanocrystalline lithography structure is proposed. The focal spot with the minimum feature width of 28 nm and the exposure depth of 30nm is obtained by theoretical simulation. Compared with the traditional lithography structure based on Bowtie, the focal spot size is compressed by nearly 67.3, and the verification experiment is carried out, and the lithography results with the minimum feature width of 31nm are obtained. At the same time, compared with the traditional Bowtie lithography structure, the depth of the exposure pattern from 30nm to 100nm is nearly five times higher than that of the traditional Bowtie lithography structure. The effect of the enhanced lithography structure on compression focal spot size and exposure depth is verified.
【学位授予单位】：中国科学院研究生院（光电技术研究所）
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7
[Abstract]:Local Surface Plasma (Local Surface Plasmon LSP (LSP) nanocrystalline lithography technology has become a hotspot in the field of nano-lithography with the advantages of simple system structure, flexible writing method, no mask and resolution beyond the diffraction limit. The so-called LSP nano-lithography technology, which uses a long wavelength light source to illuminate a probe or hole of sub-wavelength size, excites the LSPLSP to oscillate sharply at the tip or pore gap of the probe to form a LSP resonance at the interface between the probe or the pore and the medium. Superdiffractive focusing spot was obtained by using the short wavelength characteristics of Surface Plasmon SP and applied to superdiffractive nanocrystalline lithography. However, in LSP resonance nanocrystalline lithography, evanescent waves with high frequency information produced by LSP oscillation propagate only on the surface of excited structure, and decay exponentially in the direction perpendicular to the surface of excited structure, which requires that in LSP nanocrystalline lithography, The distance between the excitation structure and the optical recording medium must be in the range of several nanometers, which inevitably leads to the difficulty of distance control. At the same time the field distribution of evanescent wave in the direction of exponential attenuation in the vertical surface also leads to the problems of low exposure depth low contrast and blurry edge of nano-lithography. This limits the further application of nanometer lithography based on LSP. In order to solve these problems, the electromagnetic field characteristics and resonance behavior of the bow tie Bowtie structure which is used to excite LSP are studied in this paper. The Bowtie pore structure is combined with the metal-dielectric metal structure. An enhanced nanocrystalline lithography structure based on LSP resonance is proposed. By controlling the LSP and its resonance behavior, the focusing spot with depth expansion, size compression and strength enhancement is obtained. The main innovation of this paper is: 1. The transmission enhancement principle of LSP nanocrystalline lithography based on Bowtie pore and the influencing factors of lithography quality are analyzed. A new type of Bowtie (B) metal (M) dielectric (I) metal (M) enhanced nanocrystalline lithography structure is proposed. The focal spot with the minimum feature width of 28 nm and the exposure depth of 30nm is obtained by theoretical simulation. Compared with the traditional lithography structure based on Bowtie, the focal spot size is compressed by nearly 67.3, and the verification experiment is carried out, and the lithography results with the minimum feature width of 31nm are obtained. At the same time, compared with the traditional Bowtie lithography structure, the depth of the exposure pattern from 30nm to 100nm is nearly five times higher than that of the traditional Bowtie lithography structure. The effect of the enhanced lithography structure on compression focal spot size and exposure depth is verified.
【学位授予单位】：中国科学院研究生院（光电技术研究所）
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7
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