抛光垫磨损非均匀性研究

发布时间：2018-03-25 00:27

本文选题：化学机械抛光　切入点：抛光垫　出处：《光学技术》2017年03期

【摘要】：抛光垫是化学机械抛光的重要组成部分,其磨损的非均匀性对被加工工件面型精度和抛光垫修整有重要影响。基于直线摆动式抛光方式,研究了抛光过程中抛光垫与工件的相对运动,建立了抛光垫磨损模型,分析了抛光工艺参数对抛光垫磨损及均匀性的影响。研究结果表明,工件与抛光垫的转速比为1.11,正弦偏心直线摆动形式,摆动幅度系数为2,摆动频率系数在0.1~0.2之间,抛光垫表面磨损更均匀,并根据抛光垫表面磨损特性优化了抛光垫形状。优化的抛光垫具有更好的面型保持性,延长了修整间隔,为抛光工艺设计提供理论指导。
[Abstract]:Polishing pad is an important part of chemical mechanical polishing. The non-uniformity of wear has an important effect on the precision of workpiece surface and the dressing of polishing pad. The relative movement of the polishing pad and the workpiece during the polishing process is studied, the wear model of the polishing pad is established, and the influence of the polishing process parameters on the wear and uniformity of the polishing pad is analyzed. The rotational speed ratio of the workpiece to the polishing pad is 1.11, the sinusoidal eccentric linear swing form, the swing amplitude coefficient is 2, the swing frequency coefficient is between 0.1 and 0.2, and the surface wear of the polishing pad is more uniform. The shape of the polishing pad is optimized according to the wear characteristics of the polishing pad. The optimized pad has better surface shape retention, prolongs the dressing interval, and provides theoretical guidance for the polishing process design.
【作者单位】：南京航空航天大学机电学院;
【基金】：中国博士后科学基金特别资助项目(2016T90451) 航空科学基金(2015ZE52056)
【分类号】：TQ050

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