低能氢负离子激发石英玻璃发光

发布时间：2018-01-28 05:39

本文关键词： 负离子石英玻璃发光羟基缺陷　出处：《中国表面工程》2017年04期 　论文类型：期刊论文

【摘要】：为研究材料辐照损伤的产生机制和缺陷的实时演变过程,在GIC4117串列加速器原有的低能负离子注入平台基础上加装光谱测量系统,实现具有"charge-up free"优点的负离子激发发光在线测量。利用20 ke V H-轰击羟基含量为20μg/g,1 100μg/g的石英玻璃测量其发射光谱,研究离子束辐照前后样品的吸收光谱。离子轰击过程中,发光中心数目随剂量先增加后缓慢衰减至平衡状态;蓝色和红色波段发光峰发光产额比可能受表面结构的影响稳定在3~4之间,低于Me V H+激发产额比。辐照前后吸收光谱反映的缺陷浓度变化与离子激发石英玻璃光谱强度变化一致。羟基含量较高的石英玻璃,发射光谱强度较低,吸收光谱强度辐照前后相对变化较小,对应产生的弗伦克尔缺陷数目较少。
[Abstract]:In order to study the mechanism of radiation damage and the evolution of defects in real time, a spectrum measurement system was installed on the basis of the low energy negative ion implantation platform of GIC4117 tandem accelerator. On-line measurement of anion excited luminescence with the advantage of "charge-up free" was realized. The hydroxyl content was 20 渭 g / g by 20ke V H- bombardment. The emission spectra of 1 100 渭 g / g quartz glass were measured and the absorption spectra of the samples before and after ion beam irradiation were studied. The luminescence yield ratio of blue and red band luminescence peaks may be stabilized in the range of 3 ~ 4 due to the influence of surface structure. The change of defect concentration reflected by absorption spectrum before and after irradiation is consistent with the change of spectral intensity of ion-excited quartz glass, and the content of hydroxyl group is higher than that of quartz glass with higher hydroxyl content. The intensity of emission spectrum is low, the relative change of absorption spectrum intensity is relatively small before and after irradiation, and the corresponding number of Frenkel defects is less.
【作者单位】：北京师范大学核科学与技术学院;北京市辐射中心;
【基金】：北京市自然科学基金(1142006)~~
【分类号】：TQ171.1
【正文快照】： 离子激发发光(Ion beam induced luminescence,IBIL)是探测离子辐照过程中材料原子外层电子激发跃迁产生的发射光谱,反映了材料中的化学键信息,可实时研究材料本身及辐照过程中产生的缺陷种类、结构及其随辐照剂量的演变情况,在CHU Y J,QIU M L,XU M,et al.Negative hydrogen

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