纳米氮化硅的表面修饰及分散稳定性研究

发布时间：2018-02-25 17:21

本文关键词： SiN 硅烷偶联剂表面改性分散稳定性　出处：《化工新型材料》2017年06期 　论文类型：期刊论文

【摘要】：用γ-甲基丙烯酰氧基丙基三甲氧基硅烷(KH-570)对纳米氮化硅(Si_3N_4)粒子进行表面修饰,采用开炼混合和硫化工艺制得Si_3N_4/丁苯橡胶(SBR)纳米复合体系,通过红外光谱(FT-IR)、接触角仪、透射电镜(TEM)和橡胶加工分析仪(RPA)对改性前后纳米Si_3N_4粒子及纳米Si_3N_4/SBR复合体系在有机体系中的分散稳定性和力学性能进行分析。结果表明:KH-570分子链成功接枝在纳米Si_3N_4表面并急剧降低了纳米粒子的表面能,有效阻止纳米颗粒团聚,提高了纳米粒子在有机体系中的分散稳定性,改善了纳米复合材料的界面粘结,增强了复合材料的力学性能。制得的改性纳米Si_3N_4/SBR表面能为35.521J/m~2,比未改性纳米Si_3N_4的表面憎水性提高了3倍以上,储能模量达到600kPa,有效提高了纳米Si_3N_4/SBR复合材料的性能。
[Abstract]:Si3N4 / SBR nanocomposite system was prepared by using 纬 -methacryloxy propyl trimethoxysilane (KH-570) to modify the surface of nano-Si _ 3N _ 4 / Si _ 3N _ 4 / Si _ 3N _ 4 / Si _ 3N _ 4 / Si _ 3N _ 4 / Si _ 3N _ 4 nanocomposite system. Transmission electron microscopy (TEM) and rubber processing analyzer (RPA) were used to analyze the dispersion stability and mechanical properties of nanosized Si_3N_4 particles and nano-#en1# composite system in organic system. The results showed that the molecular chain of KH-570 was grafted onto nano-#en2# successfully. And dramatically reduces the surface energy of nanoparticles, It can effectively prevent the agglomeration of nanoparticles, improve the dispersion stability of nanoparticles in organic system, and improve the interfacial bonding of nanocomposites. The surface energy of modified nano Si_3N_4/SBR is 35.521 J / mm2, which is more than 3 times higher than that of unmodified nano Si_3N_4, and its storage modulus reaches 600 KPA, which can effectively improve the properties of nano Si_3N_4/SBR composites.
【作者单位】：安徽理工大学材料科学与工程学院;
【基金】：国家自然科学基金资助项目(51273001)
【分类号】：TB34;TQ127.2

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