低温氧等离子体处理对单层二硫化钼薄膜表面性质影响的研究

发布时间：2018-03-24 10:07

本文选题：单层二硫化钼薄膜　切入点：低温氧等离子体　出处：《真空科学与技术学报》2017年10期

【摘要】：二硫化钼是一种类似于"三明治"结构的二维片层结构,这种特殊的结构造就了其优异的物理化学性能,具有较大的理论研究意义。本次实验运用低温氧等离子体对机械剥离的单层二硫化钼薄膜进行改性处理,研究控制处理时间不同的条件对二硫化钼薄膜的均匀度和表层电荷的影响。拉曼光谱图显示处理后的二硫化钼薄膜的E12g峰和A1g向右发生了明显的偏移,表明引入了N型掺杂。运用原子力显微镜探究材料形貌、相位和表面电荷的变化,从形貌图发现低温氧等离子体处理后的表面粗糙度有了明显的增加;原子力显微静(AFM)的相位图表明样品的均匀度以一定的规律变小;根据(AFM)表层电荷分布图,观察到低温氧等离子体处理后样品表层电荷随处理时间的增加而增加,当改性时间在40 s时,样品表层电荷全部消失。
[Abstract]:Molybdenum disulfide is a two-dimensional lamellar structure similar to the "sandwich" structure, which makes it have excellent physical and chemical properties. In this experiment, molybdenum disulfide film was modified by low temperature oxygen plasma. The effects of different treatment time on the uniformity and surface charge of molybdenum disulfide thin films were studied. Raman spectra showed that the E12g peak and the A1g shift of molybdenum disulfide films were obviously shifted to the right. The results show that N-type doping is introduced. Atomic force microscope (AFM) is used to investigate the changes of morphology, phase and surface charge. It is found that the surface roughness increased obviously after low temperature oxygen plasma treatment. The phase diagram of atomic force microscopy (AFM) shows that the uniformity of the sample decreases with a certain regularity, and according to the surface charge distribution, it is observed that the surface charge of the sample increases with the increase of treatment time after low temperature oxygen plasma treatment. When the modification time is 40 s, the surface charge of the sample disappears.
【作者单位】：江苏大学机械工程学院;传感技术国家重点实验室;
【基金】：国家自然科学基金资助项目(51675246) 镇江市科技项目(重点研发计划,GY2016014) 江苏省道路载运工具新技术应用重点实验室开放基金课题(BM20082061711)
【分类号】：TB383.2;TQ136.12

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