磁控溅射TiAlSiN硬质膜及其高温抗氧化性能

发布时间：2018-01-14 10:04

本文关键词：磁控溅射TiAlSiN硬质膜及其高温抗氧化性能　出处：《材料保护》2016年08期 　论文类型：期刊论文

【摘要】：目前,对TiAlSiN薄膜在800℃以上的抗高温氧化性研究较少。通过磁控溅射优化工艺在W18Cr4V高速钢基体上制备不同Si含量的TiAlSiN硬质薄膜,针对硬度最高的典型薄膜试样[Si含量为16.49%(原子分数)],分别在800℃和1 000℃下进行保温1 h的大气热处理。利用SEM、EDS、XRD和纳米压痕仪对薄膜的形貌、成分、相结构和硬度等进行表征。结果表明:随着Si含量从无到有并增加,薄膜硬度呈现上升-下降-上升-陡降-缓降的趋势,当Si含量为16.48%(原子分数)时,薄膜硬度达到最大值26.43 GPa,薄膜由(Ti,Al)N和Si_3N_4构成复合结构;经800℃大气热处理后薄膜表面生成大量的Al_2O_3,同未热处理试样相比,表面较为致密和平整;经1 000℃大气热处理后,膜层中的Ti、Al和Si元素外扩散形成TiO_2和Ti_2O_3等多种氧化产物,导致薄膜表面凹凸不平,甚至剥落,薄膜硬度和抗氧化效果明显下降。
[Abstract]:At present, research on high temperature oxidation resistance of TiAlSiN films is less at 800 DEG. Through TiAlSiN hard films deposited by magnetron sputtering process optimization in W18Cr4V high speed steel substrate was prepared with different Si content, the highest hardness of typical film samples the content of [Si is 16.49% (atomic fraction), respectively, 1 h atmospheric thermal insulation treatment in 800 degrees and 1000 degrees. The use of SEM, EDS, XRD and nano indentation morphology of the film composition, phase structure and hardness were studied. The results show that with Si content from scratch and increase the hardness of the films showed up - down - up - steep drop and slow down the trend, when the Si content is 16.48% (atomic fraction), the hardness reaches the maximum value of 26.43 GPa (Ti, Al) thin films by N and Si_3N_4 to form a composite structure; the surface temperature of 800 DEG C atmospheric heat treated films to generate large amounts of Al_2O_3, compared with the non heat treated samples, the surface is compact and After heat treatment at 1000 C, the diffusion of Ti, Al and Si elements in the coating form various oxidation products such as TiO_2 and Ti_2O_3, resulting in uneven surface and even spalling of the films, and the hardness and oxidation resistance of the films decrease obviously.

【作者单位】：沈阳理工大学材料科学与工程学院;沈阳市特种设备检测研究院;
【分类号】：TG174.444
【正文快照】： 0前言Ti Al Si N纳米复合薄膜作为新一代超硬膜,与Ti N和Ti Al N薄膜相比,其综合抗高温抗氧化性能及力学性能更优[1~3]。在Ti Al N薄膜中加入不同含量Si发现:不添加Si元素时,Ti Al N膜主要由柱状晶构成;Si含量为2.02%(原子分数,下同)时,膜层柱状晶趋势减弱,由亚稳相Ti(Al Si)N

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