氮氩混合比对TA2真空氮化层结构与性能的影响

发布时间：2018-03-19 10:45

本文选题：TA工业纯钛　切入点：真空渗氮　出处：《材料导报》2017年04期 　论文类型：期刊论文

【摘要】：采用间歇式真空氮化技术对TA2钛合金进行渗氮处理。探究氮氩混合比对合金氮化层结构和性能的影响规律。结果表明:表面渗氮层主要由TiN和TiN0.3相组成,氮氩比越低其有效硬化层越厚,但会降低有效活性N原子的相对含量,不利于渗层的致密性。适当的氮氩混合比能在TA2表面形成氮化物,N原子有效地向纵深扩散,氮化物层与扩散层结合紧密,过渡良好,硬度梯度平缓;腐蚀电位随着氮氩比的增加呈现逐渐上升趋势,从氮氩比为1∶5时的-0.622V提升到氮氩比为5∶1时的-0.549V,腐蚀电流和腐蚀速率则呈现出逐渐降低的趋势。
[Abstract]:TA2 titanium alloy was nitrided by intermittent vacuum nitriding. The effect of nitrogen / argon mixing ratio on the structure and properties of nitriding layer was investigated. The results showed that the nitriding layer was mainly composed of TiN and TiN0.3 phase. The lower the ratio of nitrogen to argon, the thicker the effective hardening layer, but the lower the relative content of active N atoms, which is not conducive to the densification of the layer. The nitride layer is closely bound to the diffusion layer, the transition is good, the hardness gradient is gentle, and the corrosion potential increases with the increase of the nitrogen / argon ratio. The corrosion current and corrosion rate decreased gradually from -0.622 V to -0.549 V when the ratio of nitrogen to argon was 1: 5.
【作者单位】：贵州师范大学材料与建筑工程学院;
【基金】：国家自然科学基金(51574096;51464008) 贵州省科学技术基金(黔科合LH字[2014]7047号) 贵州省科技计划(黔科合JZ字[2014]2003号)
【分类号】：TG156.82

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