钼铌合金靶材制备及其溅射薄膜性能研究

发布时间：2018-07-05 08:06

  本文选题：Mo-10Nb合金靶材 + 热压烧结　； 参考：《北方民族大学》2017年硕士论文

【摘要】：本文以钼粉、铌粉为原料,采用热压烧结工艺制备Mo-10Nb合金靶材,并将Mo-10Nb靶材用于直流磁控溅射镀膜,分析Mo-10Nb靶材的制备工艺对溅射薄膜性能与微观形貌的影响。通过研究不同热压工艺参数和Nb粉含量对Mo-10Nb合金靶材致密度和微观形貌的影响,探索合适的热压工艺参数,从而制备出高纯、高致密和晶粒均匀的Mo-10Nb合金靶材,并探讨了制备工艺对磁控溅射薄膜性能的影响。本实验采用X射线衍射仪、四探针电阻仪、AFM和SEM等分别表征溅射薄膜的择优取向、结晶性、导电性能、表面粗糙度、截面形貌及薄膜厚度,继而确定Mo-10Nb合金靶材的热压温度与薄膜性能之间的关系。研究结果表明:采用热压烧结工艺比无压烧结工艺更容易获得高致密、结晶性好和Nb元素分布均匀的Mo-10Nb合金靶材,且Mo-10Nb合金热压烧结的致密化过程与McClelland(麦克莱兰德)热压方程吻合,表明热压烧结温度和压力是Mo-10Nb合金致密化的关键因素。同时,通过研究加入不同含量Nb粉对Mo-Nb合金靶材的物相、致密度、微观形貌等的影响,得出10 wt%的Nb粉加入有利于靶材的致密化和晶粒细化。此外,对Nb粉含量为10 wt%时,不同热压烧结温度制备的Mo-10Nb合金靶材进行磁控溅射,分析其溅射薄膜的性能,结果表明:热压烧结温度为1820℃,保温时间为2 h,压力为15 MPa时,制备的Mo-10Nb合金靶材,其溅射薄膜的结晶性较好,择优取向为(110)晶面,表面粗糙度为87 nm,方阻值为0.1?(14)?。
[Abstract]:Mo-10Nb alloy targets were prepared by hot pressing sintering with molybdenum powder and niobium powder as raw materials. Mo-10Nb targets were used in DC magnetron sputtering deposition. Mo-10Nb alloy targets with high purity, high density and uniform grain size were prepared by studying the effects of different hot pressing process parameters and NB powder content on the density and micromorphology of Mo-10Nb alloy targets. The effect of preparation process on the properties of magnetron sputtering films was discussed. X-ray diffractometer, AFM and SEM were used to characterize the preferred orientation, crystallinity, conductivity, surface roughness, cross-section morphology and film thickness of the sputtering films, respectively. Then the relationship between hot pressing temperature and film properties of Mo-10Nb alloy target was determined. The results show that it is easier to obtain Mo-10Nb alloy targets with high density, good crystallinity and uniform distribution of NB elements by hot pressing sintering than by pressureless sintering. The densification process of Mo-10Nb alloy is in agreement with the McClelland (McClelland) hot pressing equation, which indicates that the sintering temperature and pressure are the key factors for the densification of Mo-10Nb alloy. At the same time, the effects of NB powder with different content on the phase, densification and micromorphology of Mo-Nb alloy target were studied. It was concluded that the addition of 10 wt% NB powder was beneficial to the densification and grain refinement of the target. In addition, the magnetron sputtering of Mo-10Nb alloy target prepared by different hot pressing sintering temperature was carried out when NB powder content was 10 wt%. The results showed that the sintering temperature was 1820 鈩，

本文编号：2099549