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离子束辅助沉积双轴织构过渡层研究

发布时间:2019-02-24 14:10
【摘要】:第二代高温超导带材YBa_2Cu_3O_(7-x)(YBCO)以其高不可逆场和大电流承载能力,在输电线缆、电动机、超强磁体、限流器等领域有着极其广阔的应用前景。但是目前仍有一些限制高温超导带材的商业化应用因素如:高质量的双轴织构、带材的均匀性和低的带材制备成本。因此,本文致力于在金属基底上制备低成本、高质量双轴织构缓冲层。主要内容有:1、利用溶液沉积平坦化(SDP)系统在哈氏合金(Hastelloy C276)基底表面制备出适合IBAD-MgO生长的Y_2O_3非晶薄膜衬底,采用离子束辅助沉积(IBAD)技术,在Y_2O_3非晶薄膜表面制备MgO双轴织构缓冲层。通过对离子束辅助沉积系统中各参数的研究与分析,得到了IBAD-MgO薄膜形成双轴织构的最优工艺,可以制备出面外半高宽3°、面内半高宽6°的MgO薄膜。实验过程中我们发现:在各影响因素中,沉积速率对薄膜的面内外织构影响最为显著。得到的IBAD-MgO薄膜表面粗糙度为2nm左右,可以为后续LMO层的制备提供条件。并且成功制备出一条40m长的IBAD-MgO带材,经测试,其面外半高宽3°左右、面内半高宽6°左右,说明薄膜织构质量较好且均匀性良好。2、由于IBAD-MgO薄膜形成双轴织构的条件较为严格,于是利用离子束辅助沉积系统对新材料进行实验,发现Na F和Na Cl都可以用IBAD技术实现薄膜的织构化,经织构化的Na F薄膜面外和面内半高宽分别为2.1°和6.9°,Na Cl薄膜面外和面内半高宽分别为2.8°和7.7°。与MgO的IBAD织构化工艺相比,它们的制备工艺窗口宽:Na F和Na Cl薄膜形成较优双轴织构对沉积速率的要求分别为0.1-0.25nm/s和0.05-0.3nm/s,而MgO的沉积速率范围是0.175-0.2nm/s;对Y_2O_3非晶层衬底的表面粗糙度要求低:IBAD-Na F在涂覆了8层的Y_2O_3非晶层(RMS=5.2nm)上就可以形成质量较好的双轴织构,IBAD-Na Cl获得较优的双轴织构只需要涂覆4层的Y_2O_3非晶层(RMS=9.7nm)衬底即可。IBAD-Na F和IBAD-Na Cl获得双轴织构的实现难度低,可以提高制备效率并降低成本。
[Abstract]:The second generation high temperature superconducting tape YBa_2Cu_3O_ (7-x) (YBCO) has a wide application prospect in transmission cable, motor, super strong magnet, current limiter and so on because of its high irreversible field and high current bearing capacity. However, there are still some factors restricting the commercial application of HTS tapes, such as high quality biaxial texture, uniformity and low cost. Therefore, low cost and high quality biaxial texture buffers are prepared on metal substrates. The main contents are as follows: 1. Y_2O_3 amorphous film substrates suitable for IBAD-MgO growth were prepared on the substrate of Hastelloy C276 by solution deposition flattened (SDP) system. Ion beam assisted deposition of (IBAD) was used. MgO biaxial texture buffer layer was prepared on the surface of Y_2O_3 amorphous film. Through the study and analysis of the parameters in the ion beam assisted deposition system, the optimal process for the formation of biaxial texture of IBAD-MgO thin films is obtained. The MgO films with an outer half maximum width of 3 掳and an in-plane half maximum width of 6 掳can be prepared. During the experiment, we found that the deposition rate has the most significant effect on the in-plane texture of the films. The surface roughness of the obtained IBAD-MgO film is about 2nm, which can provide the conditions for the subsequent preparation of LMO layer. A 40m long IBAD-MgO strip has been successfully prepared. The results show that the width of the IBAD-MgO strip is about 3 掳outside the plane and 6 掳in the inside, which shows that the texture quality of the film is good and the uniformity is good. 2. Due to the strict conditions for biaxial texture formation of IBAD-MgO thin films, the new materials are tested by ion beam assisted deposition system. It is found that both Na F and Na Cl can realize the texturing of the films by IBAD technology. The textured Na F films have an out-of-plane and in-plane half-widths of 2.1 掳and 6.9 掳, Na Cl, respectively, and 2.8 掳and 7.7 掳of the out-of-plane and in-plane widths, respectively. Compared with MgO's IBAD texturing process, the optimal biaxial textures of: Na F and Na Cl films are 0.1-0.25nm/s and 0.05-0.3 nm / s, respectively. The deposition rate of MgO was 0.175-0.2 nm / s; The surface roughness of Y_2O_3 amorphous substrate is low: IBAD-Na F can form good quality biaxial texture on Y_2O_3 amorphous layer (RMS=5.2nm) coated with 8 layers. IBAD-Na Cl only needs 4 layers of Y_2O_3 amorphous layer (RMS=9.7nm) substrate to obtain the best biaxial texture. It is easy to obtain biaxial texture by IBAD-Na F and IBAD-Na Cl, which can improve the preparation efficiency and reduce the cost.
【学位授予单位】:电子科技大学
【学位级别】:硕士
【学位授予年份】:2017
【分类号】:TG174.4

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