LBO晶体非水基抛光液固结磨料抛光的基础研究

发布时间：2018-01-07 09:02

本文关键词：LBO晶体非水基抛光液固结磨料抛光的基础研究　出处：《南京航空航天大学》2015年硕士论文　论文类型：学位论文

【摘要】：LBO(LiB3O5,三硼酸锂)晶体具有优异的非线性光学性能,在全固态激光器、惯性约束聚变、激光显示等领域具有关键地位和广泛应用。然而,LBO晶体具有质软、性脆、微潮解等特性,加工难度大,其表面质量直接关系到倍频器件的使用性能,进而影响高质量的激光输出。本文首次提出非水基抛光液固结磨料抛光LBO晶体特定晶面(θ=90°,φ=13.8°),开展的主要研究工作和结果如下:(1)对比三种固结磨料研磨垫修整方式,并对LBO晶体特定晶面的研磨工艺进行优化。确定先游离碳化硅修整再用油石修整,可高效修复研磨垫的切削作用,并有效减少研磨划伤。研磨压力28 kPa时获得的工件表面粗糙度Sa值达9.25 nm,材料去除率为481 nm/min。(2)优选合适硬度的固结磨料抛光垫及其磨料类型,采用单因素法分步优化酸性水基抛光液中pH调节剂的种类和pH值,研究抛光液化学环境对LBO晶体特定晶面的作用机制。柠檬酸最具合适的化学活性,乳酸、草酸、醋酸次之。随着柠檬酸水基抛光液pH值的增大,表面粗糙度Sa值先下降后上升,pH=5.0时,LBO晶体获得最低的表面粗糙度Sa值0.32 nm,表面光滑无损伤,并保持材料去除率366 nm/min。(3)优选非水基抛光液的溶剂,采用单因素法优化抛光液中化学添加剂的组分及其浓度。随着化学添加剂浓度的增大,添加乳酸、双氧水和去离子水的酒精基抛光液获得的表面粗糙度Sa值都先下降后上升,并分别在浓度25 vol.%、5 vol.%、15 vol.%时获得最佳表面质量,材料去除率基本都呈上升趋势。(4)采用正交实验法综合优化非水基抛光液和工艺参数对抛光质量的影响:抛光压力是首要因素;乳酸和双氧水分别起到腐蚀和缓蚀作用,但需要低浓度的去离子水提供合适的电离环境。正交实验获得的最优方案为去离子水浓度16 vol.%、抛光压力21 kPa、乳酸浓度22 vol.%和双氧水浓度5 vol.%,可高质量实现LBO晶体特定晶面的非水基抛光,表面粗糙度Sa值达0.62 nm,材料去除率为392 nm/min。
[Abstract]:LBO (LiB3O5, three lithium borate) crystal has excellent nonlinear properties, in all solid state laser, ICF, laser display and other fields has a key position and widely used. However, LBO crystal has a soft, brittle, micro deliquescence characteristics, processing difficulty, the surface quality is directly related to the use of performance a frequency doubling device, thereby affecting laser output of high quality. This paper first proposed the non aqueous polishing liquid fixed abrasive polishing of LBO crystal specific crystal plane (theta =90 degrees, =13.8 degrees, phi) the main research work and results are as follows: (1) comparison of three kinds of fixed abrasive pad dressing, and the specific LBO crystal the crystal surface of the grinding process were optimized. Then determine the first free silicon carbide dressing oilstone dressing, cutting action efficient repair grinding pad, and effectively reduce the grinding scratches. The surface of the workpiece grinding pressure obtained at 28 kPa roughness Sa value of 9. 25 nm, the material removal rate is 481 nm/min. (2) fixed abrasive polishing pad and abrasive type selecting suitable hardness, step-by-step optimization type and pH acidic water-based slurry pH value regulator using single factor method of polishing liquid chemical environment of LBO crystal specific crystal surface mechanism of citric acid. The most chemical activity suitable, lactic acid, oxalic acid and acetic acid. With the increase of citric acid water-based slurry pH, surface roughness Sa value decreased first and then increased, pH=5.0, LBO crystal to obtain the lowest surface roughness Sa value 0.32 nm, smooth surface without damage, and keep the material removal rate of 366 nm/min. (3) preferred non aqueous slurry solvent, the composition and concentration of chemical additives optimum polishing liquid in single factor method. With the increase of the concentration of lactic acid, chemical additives, alcohol based surface polishing liquid hydrogen peroxide and deionized water to obtain the surface roughness Sa Values are decreased and then increased, and were in a concentration of 25 vol.%, 5 vol.%, 15 vol.% to obtain the best surface quality, material removal rate increased. (4) by using orthogonal experimental method, comprehensive optimization effect of water-based polishing liquid and process parameters on the polishing quality: polishing pressure is the primary factor; lactic acid and hydrogen peroxide respectively as corrosion and corrosion inhibition, but low concentration of deionized water to provide a proper environment for the optimal solution. The ionization orthogonal experiment obtained deionized water concentration was 16 vol.%, the polishing pressure of 21 kPa, 22 vol.% concentration of lactic acid and hydrogen peroxide concentration of 5 vol.%, can achieve high quality LBO crystal crystal face specific non water-based polishing. The surface roughness Sa value of 0.62 nm, the material removal rate is 392 nm/min.

【学位授予单位】：南京航空航天大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TG580.6

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