基于梯度聚类离散思想的磁流变抛光自适应轨迹

发布时间：2018-01-19 13:39

本文关键词： 磁流变抛光迭代误差梯度聚类离散自适应轨迹　出处：《强激光与粒子束》2015年12期 　论文类型：期刊论文

【摘要】：针对磁流变抛光过程中抛光轨迹会引入迭代误差的问题,设计了步长和行距随光学表面梯度自适应变化的光栅线抛光轨迹。首先根据光学元件的表面误差分布,利用标准五点法获得面形各点的梯度值,再基于聚类离散思想将所有面形点根据梯度值大小进行了归类,从而得到轨迹步长和行距随面形误差变化的自适应轨迹。在自研的磁流变加工机床上进行了实验研究,将一块直径50mm的微晶玻璃,从峰谷值为65nm、均方根值为12nm收敛到峰谷值为21nm、均方根值为2.5nm,并且在加工后的表面功率谱密度曲线上没有出现明显的尖峰误差。实验结果表明,这种自适应轨迹能有效抑制中高频误差。
[Abstract]:In order to solve the problem that iterative error is introduced into the polishing trajectory during magnetorheological polishing (MRF), a grating line polishing trajectory with adaptive change of step size and row spacing with optical surface gradient is designed. Firstly, the error distribution of optical elements is considered. Using the standard five-point method to obtain the gradient values of each point in a plane shape, and then classifying all the points of a plane shape according to the size of the gradient value based on the idea of clustering discretization. The adaptive trajectory of trajectory step size and row spacing varying with the plane shape error was obtained. The experimental study was carried out on the self-developed magnetorheological machining machine. A 50 mm diameter glass-ceramics was obtained from the peak to valley value of 65 nm. The root-mean-square value converges to the peak and valley value of 21 nm and the root mean square value is 2.5 nm, and there is no obvious peak error on the surface power spectral density curve. This adaptive trajectory can effectively suppress the middle and high frequency errors.
【作者单位】：中国工程物理研究院机械制造工艺研究所;
【基金】：国防基础科研项目(A1520133005) 中国工程物理研究院“双百人才工程”课题(K961-15-SRG)
【分类号】：TG580.692
【正文快照】： 磁流变抛光技术是一种先进的柔性抛光技术,具备实现高面形精度、超光滑与低缺陷等优点[1],在强激光光学中有着十分重要而广阔的应用前景。在磁流变抛光过程中,抛光磨头是以一定的进给步距(本文为表述方便,将沿抛光轮进给方向的步长和光栅线行距统称为步距)做进给运动的。由于

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