靶面放电特性对沉积粒子离化率及沉积行为的影响

发布时间：2018-05-15 07:12

本文选题：磁控溅射离子镀 + 气体放电伏安特性　；参考：《金属学报》2015年12期

【摘要】：依据气体放电等离子体物理学知识,通过增加靶材的电流密度将靶面气体放电引入至辉光与弧光放电之间的辉弧放电过渡区.借助Ar+轰击靶面的碰撞动能和电子传输所产生的Joule热能,共同诱发靶面电子与原子克服表面逸出功的自发射.由此获得高密度、高离化和高能量的沉积粒子.实验分别在辉光放电区和辉弧过渡区各制备2组纯Ti薄膜.利用激光共聚焦显微镜(CLSM)对不同靶基距处的薄膜厚度进行测量,通过XRD,SEM,AFM和TEM对薄膜的微观结构进行观察,并使用涂层附着力划痕仪对薄膜的膜基结合力进行测试.实验结果表明:在辉弧放电过渡区内所沉积的纯Ti薄膜具有纳米尺度的晶粒、致密的组织、均匀的薄膜厚度、较快的沉积速率和优异的膜基结合强度.
[Abstract]:According to the physical knowledge of gas discharge plasma, the target surface gas discharge is introduced into the transition region between glow discharge and arc discharge by increasing the current density of the target. With the aid of the collision kinetic energy of ar bombarding the target surface and the Joule heat energy generated by electron transport, the self-emission of target electrons and atoms to overcome the surface escape work is induced together. Thus, high density, high ionization and high energy deposition particles are obtained. Two groups of pure Ti thin films were prepared in the glow discharge region and the glow arc transition region respectively. The thickness of films at different substrate distances was measured by laser confocal microscopy. The microstructure of the films was observed by XRDX SEMAFM and TEM, and the adhesion of the films was measured by scratch tester. The experimental results show that the pure Ti thin films deposited in the arc discharge transition zone have nanoscale grains, dense microstructure, uniform film thickness, fast deposition rate and excellent substrate bonding strength.
【作者单位】：西安理工大学材料科学与工程学院;南京工业大学材料科学与工程学院;
【基金】：国家自然科学基金资助项目51271144~~
【分类号】：TG174.4

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