划痕法结合强度临界载荷值的影响因素分析
发布时间:2018-07-08 12:29
本文选题:磁控溅射 + Ti ; 参考:《表面技术》2015年09期
【摘要】:目的研究划痕法测试参数对临界失效载荷的影响,以便更准确地测定硬质薄膜的结合强度。方法采用磁控溅射技术在304不锈钢和Si片上制备氮化钛(Ti N)薄膜。采用扫描电镜观察薄膜的截面形貌和厚度,采用纳米压入法测试薄膜的硬度,采用划痕法测试薄膜的结合强度,研究不同划痕长度、划动速率和加载速率对临界载荷的影响。结果所制备Ti N薄膜致密,厚度约2μm,纳米压入硬度约2300HV,Ti N/304不锈钢体系为硬膜软基体。相同加载载荷(10 N)和划动行程(3 mm)条件下,增加划动速率(1~3 mm/min),导致首次声发射信号延迟;相同加载载荷(10 N)和划动速率(3 mm/min)条件下,随着划动行程的增加(3~9 mm),第三、四类失效模式逐渐减弱。结论采用划痕法测定结合强度时,应该以划痕形貌同时出现第一到第四模式时判断失效,并且对应典型声发射信号为参考;合理的测试参数范围,可重复出现临界载荷值。制备的Ti N薄膜声发射信号存在共同的临界特征值4.9 N,结合划痕形貌特征,判定其结合强度值为4.9 N。
[Abstract]:Aim to study the effect of scratch test parameters on critical failure load in order to determine the bonding strength of hard film more accurately. Methods Titanium nitride (tin) thin films were prepared on 304 stainless steel and Si substrates by magnetron sputtering. The morphology and thickness of the films were observed by scanning electron microscope (SEM), the hardness of the films was measured by nano-indentation method, the bonding strength of the films was measured by scratch method, and the effects of different scratch lengths, scratching rates and loading rates on the critical loads were studied. Results the Ti N thin films were dense and the thickness was about 2 渭 m, and the hardness of the nanocomposites was about 2300 HVN / 304 stainless steel. Under the same loading load (10 N) and stroke (3 mm), the increase of stroke rate (1 ~ 3 mm/min) leads to the delay of first acoustic emission signal, and under the same loading load (10 N) and stroke rate (3 mm/min), with the increase of stroke (3 ~ 9 mm), Four types of failure modes are gradually weakened. Conclusion in the determination of bonding strength by scratch method, failure should be judged by the first to fourth modes of scratch appearance, and corresponding to typical acoustic emission signals, and the critical load value can be repeated in a reasonable range of test parameters. There is a common critical eigenvalue of 4.9 N in the acoustic emission signal of the prepared tin film, and the binding strength of the film is determined to be 4.9 N. combined with the scratch morphology.
【作者单位】: 装甲兵工程学院再制造技术重点实验室;
【基金】:国家自然科学基金项目(51102283) 北京市自然科学基金项目(3132024)~~
【分类号】:TG174.4;TB302
【共引文献】
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