利用D-D核反应对氘在钯中沉积行为的研究

发布时间：2018-06-29 15:18

本文选题：钯 + D-D核反应　；参考：《核技术》2017年02期

【摘要】：氢同位素在钯中的沉积行为与它在钯靶中的溶解度、扩散速率以及缺陷的束缚有关。为研究氘离子在钯中的沉积行为,利用氘离子诱发D-D核反应的方法研究了氘在钯中的动态和静态浓度,并建立扩散模型对实验结果进行了分析。研究发现,除稳定束缚在缺陷中的氘之外,束流注入时动态氘浓度还包含自由扩散的氘以及非稳定束缚态氘;自由扩散的氘以及非稳定束缚态氘随着氘离子的注入而增加,当注入达到饱和后,这两部分氘浓度处于动态平衡状态,停束后将迅速减少直至消失;由于辐照损伤所造成的缺陷存在饱和值,稳定束缚在缺陷中的静态氘浓度为x=(0.42±0.03)%;结合模拟计算,发现钯的缺陷对氢同位素的吸附系数、解吸附系数及其比值k_A/k_D与材料损伤特性及氢同位素的注入方式有关。
[Abstract]:The deposition behavior of hydrogen isotopes in palladium is related to its solubility, diffusion rate and imperfection binding in the palladium target. In order to study the deposition behavior of deuterium ions in palladium, the dynamic and static concentrations of deuterium in palladium were studied by deuterium ion-induced D-D nuclear reaction, and the experimental results were analyzed by a diffusion model. It is found that in addition to the deuterium bound in the defect, the dynamic deuterium concentration during beam implantation also includes deuterium with free diffusion and deuterium in unsteady bound state, and the deuterium and unsteady bound deuterium in free diffusion increase with the implantation of deuterium ion. When the injection reaches saturation, the deuterium concentration of the two parts is in a dynamic equilibrium state, and the deuterium concentration decreases rapidly until it disappears after stopping the beam. The static deuterium concentration bound to the defects is x = (0.42 卤0.03), and it is found that the adsorption coefficient of hydrogen isotope, desorption coefficient and the ratio of K _ S / k _ D of PD defects are related to the damage characteristics of the material and the way of hydrogen isotope injection.
【作者单位】：兰州大学核科学与技术学院;
【基金】：国家自然科学基金(No.11275085、No.11305080、No.11405079) 中央高校基本科研业务费(No.lzujbky-2016-36) 日本科研补助金(No.19340051)资助~~
【分类号】：O571.42

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