双侧波导同轴线耦合式线形微波等离子体源的研究

发布时间：2019-04-03 18:15

【摘要】：本文介绍了一种具有双侧波导同轴线耦合结构的新型微波等离子体源。通过电磁场模拟计算和等离子体发射光谱测量对同轴线耦合反应腔内部结构进行了优化,研究了线形等离子体源腔体结构对等离子体均匀性和长度的影响,并且在杆状样品表面进行了金刚石薄膜的沉积实验。实验结果表明:双侧波导同轴线耦合式新型线形等离子体源可以在引导天线表面产生圆柱状的线形等离子体,其等离子体的均匀性和长度受腔体内部结构的影响,在引导天线外径为4 mm,单侧模式匹配棒伸入量为10 mm的腔体结构下,等离子体的均匀性大于90%。通过对杆状样品表面不同位置处金刚石膜质量和等离子体沉积环境的测量,进一步验证了等离子体的均匀性。此外,线形等离子体的长度受引导天线长度和工作气压影响,这主要与反应腔内电磁场分布以及微波传输衰减有关。
[Abstract]:A novel microwave plasma source with two-side waveguide coaxial coupling structure is presented in this paper. The internal structure of coaxial coupling reaction chamber was optimized by electromagnetic field simulation and plasma emission spectrum measurement. The influence of the structure of linear plasma source cavity on the uniformity and length of plasma was studied. The diamond films were deposited on the surface of rod-like samples. The experimental results show that a cylindrical linear plasma can be produced on the surface of the guided antenna by a new type of linear plasma source coupled with the coaxial lines of both sides of the waveguide. The uniformity and length of the plasma are affected by the internal structure of the cavity. When the external diameter of the guided antenna is 4 mm, the plasma uniformity is more than 90% when the extension of the one-sided mode matching rod is 10 mm. The plasma uniformity was further verified by measuring the diamond film quality and plasma deposition environment at different positions on the surface of the rod sample. In addition, the length of linear plasma is affected by the length of guided antenna and working pressure, which is mainly related to the distribution of electromagnetic field in the reaction chamber and the attenuation of microwave transmission.
【作者单位】：武汉工程大学材料科学与工程学院等离子体化学与新材料湖北省重点实验室;
【基金】：国家自然科学基金项目(批准号:11575134)资助的课题
【分类号】：O53

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