铁酸锌基印迹复合光催化剂的制备及其在选择性降解环丙沙星残留中的应用研究

发布时间：2018-01-05 02:10

本文关键词：铁酸锌基印迹复合光催化剂的制备及其在选择性降解环丙沙星残留中的应用研究　出处：《江苏大学》2017年硕士论文　论文类型：学位论文

【摘要】：环丙沙星残留对生态环境危害巨大,使病源细菌产生抗药性,从而使环丙沙星对其失去功效,严重威胁着人类健康和社会的可持续发展。同时,这种污染物在环境中通常是以微量或痕量的形式存在,但却含有高毒性特点。光催化技术以半导体为催化剂,光为能量,将有机污染物矿化为H2O,CO2和其他无毒无害的小分子,是一种高效、无污染、低成本的高级氧化技术。ZnFe_2O_4,常见的磁性半导体光催化材料,具有禁带宽度较窄、光化学性能稳定以及磁分离性能优异等特点,促使其在光催化领域中占有重要一席之地。此外,通过分子印迹技术制备的分子印迹聚合物可以提供专一性吸附能力,其能够将环境中微量或痕量的污染物优先吸附在催化剂的表面;且聚合物性质稳定、合成成本低、易于大量制备。因此,本论文中结合光催化技术和分子印迹技术的优点,制备出对特定污染物具有高效选择性去除能力的印迹光催化剂,并考察不同合成因素合成的印迹光催化剂对环丙沙星的去除效果。本工作主要包含以下三个方面的内容:(1)通过浸渍煅烧法制备ZnFe_2O_4@ZnO光催化剂并以其作为载体,再利用分子印迹技术包覆一层传统印迹聚合物,制备出Zn Fe_2O_4@ZnO印迹复合光催化剂。利用XRD、FT-IR、SEM(EDS)、TEM、UV-vis DRS、VSM、PL、EIS、氮气吸附-脱附实验、XPS和ESR技术对催化剂的形貌、结构及性能进行测试。此外,还详细的考察了不同ZnO复合量和不同单体加入量对印迹光催化剂的影响。最后,分别对比恩诺沙星和5-磺基水杨酸,考察Zn Fe_2O_4@Zn O印迹复合光催化剂对环丙沙星的选择性降解效果。(2)通过溶剂热法制备ZnFe_2O_4,再在其表面包覆一层导电印迹聚合物层,制备出ZnFe_2O_4/PPy印迹复合光催化剂。通过XRD、FT-IR、SEM(EDS)、TEM、UV-vis DRS、VSM、PL、EIS和氮气吸附-脱附实验对制得的光催化剂的形貌、结构及性能进行了系统表征。此外,还详细考察了不同单体聚合时间和单体含量对ZnFe_2O_4/PPy印迹复合光催化剂的影响,探讨了其选择性光催化降解应用,并阐明了其选择性光催化反应机理。(3)通过溶剂热-煅烧法和分子印迹技术制备出了具有选择性光催化降解能力的ZnFe_2O_4-Ag/PATP印迹复合光催化剂,并通过XRD、FT-IR、SEM(EDS)、TEM、UV-vis DRS、VSM、PL、EIS、氮气吸附-脱附实验和XPS对制得的光催化剂进行了系统表征。此外,还详细考察了不同Ag含量和不同单体含量对印迹光催化剂的影响。同时,分别对比恩诺沙星和5-磺基水杨酸,探讨了Zn Fe_2O_4-Ag/PATP印迹复合光催化剂对环丙沙星的选择性降解效果。最后,探讨了该印迹光催化剂对环丙沙星的选择性光催化降解机理。
[Abstract]:Ciprofloxacin great harm to the ecological environment, the pathogenic bacteria resistant to ciprofloxacin, thereby lose efficacy of the serious threat to human health and sustainable development of the society. At the same time, the pollutants in the environment is usually to trace the exist in the form, but with high toxicity. The photocatalytic technology for catalyst in the semiconductor, light energy, the mineralization of organic pollutants as H2O, CO2 and other small molecules, non-toxic and harmless, is an efficient, pollution-free, low cost.ZnFe_2O_4 advanced oxidation technology, magnetic semiconductor photocatalytic materials commonly, with narrow band gap, photochemical properties of stability and magnetic separation performance characteristics the important, a space for one person in the field of photocatalytic. In addition, the molecularly imprinted polymer was prepared by molecular imprinting technique can provide specific adsorption capacity, it can The pollutants in the environment trace is preferentially adsorbed on the surface of the catalyst; and the polymer properties of stability, low synthesis cost, easy mass production. Therefore, this paper combines the advantages of photocatalytic technology and molecular imprinting technique, preparation of imprinted photocatalyst with highly selective removal of specific contaminants, and the effects of removal the effect of ciprofloxacin imprinted photocatalysts with different synthesis synthesis factors. This work mainly includes the following three aspects: (1) ZnFe_2O_4@ZnO was prepared by impregnation calcination catalyst and its carrier, and molecular imprinting technology by coating a layer of traditional imprinted polymer, preparation of Zn composite photocatalyst. Using Fe_2O_4@ZnO blot XRD, FT-IR, SEM (EDS) TEM, UV-vis, DRS, VSM, PL, EIS, nitrogen adsorption desorption experiment, the morphology of XPS and ESR technology of catalyst, structure and properties were tested. In addition, also with the effects of different amount of ZnO composite and different monomer amount on the imprinted photocatalyst. Finally, respectively enrofloxacin and 5- sulfosalicylic acid, the effects of Zn Fe_2O_4@Zn O imprinted composite photocatalyst on ciprofloxacin selective degradation effect. (2) the preparation of ZnFe_2O_4 by solvothermal method, and then coated with a layer of conductive polymer layer on the surface, the preparation of ZnFe_2O_4/PPy imprinted composite photocatalyst. Through XRD, FT-IR, SEM (EDS) TEM, UV-vis, DRS, VSM, PL, EIS and N2 adsorption desorption experiments of the prepared photocatalyst morphology, structure and properties were systematically characterized. In addition also, the effects of polymerization time with different monomer and monomer content of ZnFe_2O_4/PPy imprinted composite photocatalyst, discusses the application of selective photocatalytic degradation, and expounds its selective photocatalytic reaction mechanism. (3) by solvent thermal forging Burning method and molecular imprinting technique to fabricate ZnFe_2O_4-Ag/PATP imprinted composite photocatalyst with selective photocatalytic degradation ability, and through XRD, FT-IR, SEM (EDS) TEM, UV-vis, DRS, VSM, PL, EIS, nitrogen adsorption desorption and XPS on the catalyst were characterized. In addition, also with the effects of different Ag content and monomer content on the imprinted photocatalyst. At the same time, respectively enrofloxacin and 5- sulfosalicylic acid, discusses Zn Fe_2O_4-Ag/PATP imprinted composite photocatalyst on ciprofloxacin selective degradation effect. Finally, discusses the imprinted photocatalyst on selective catalytic ciprofloxacin the degradation mechanism.

【学位授予单位】：江苏大学
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：X52;O643.36

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