垃圾渗滤液光化学组合工艺试验研究与装置研发

发布时间：2018-03-06 07:06

  本文选题：垃圾渗滤液　切入点：臭氧　出处：《南昌大学》2017年硕士论文　论文类型：学位论文

【摘要】：臭氧作为目前高级氧化技术中重要的氧化剂,具有氧化能力强、氧化速度快等特点,已经被运用处理高浓度有机废水。垃圾渗滤液是一种含有高分子、难降解有机物的废水,目前的传统生化处理已经很难达到处理排放标准。臭氧高级氧化技术+生化处理作为新一代垃圾渗滤液处理工艺,不仅能够降低处理成本,而且易于形成模块化管理,已越来越受到工程界的重视。本文采用UV/H2O2/O3组合工艺对垃圾渗滤液二级出水进行试验研究,探究了最佳处理操作条件,并针对UV/H2O2/O3组合工艺体系设计了一套适用于此体系的光化学反应器,对高级氧化降解过程中的有机物进行了分析。通过实验分析,可以得出以下结论:(1)在室温20±1℃环境下,UV/H2O2/O3组合工艺对垃圾渗滤液二级出水进行深度氧化处理的最佳操作条件是:反应时间为180min、紫外光强度为10W、臭氧进气流量为160L/h、30%双氧水用量为50mL/L,pH为9。在最佳的操作条件下,COD、氨氮和色度的去除率分别为:84.22%、100%、99.38%。废水的可生化性得到显著提高,B/C由原来的0.01处理后提升到0.31,增幅比较明显。(2)设计的新型光化学反应器不仅解决了色度对光化学氧化的处理影响问题,而且还通过采用尾气回用方式进一步提高臭氧利用率,使平均臭氧利用率由原来的80.03%提升到现在的87.22%,提升了7.19%,节约了深度处理垃圾渗滤液的处理成本。(3)为了探究垃圾渗滤液在高级氧化过程中有机物降解过程,进一步了解有机物降解机理,本试验采用GC-MS对高级氧化处理后有机物进行测试,得到了氧化过程中有机物的分解过程。通过分析可以得到,经过UV/H2O2/O3组合工艺处理后有机物不仅在成分上,而且在有机物种类上都得到明显的改善。在氧化过程中高分子物质被羟基自由基攻击分解为能够被检测到的小分子物质;出水中还明显检测分析出更多的卤代烃,说明原液中的卤代基团受到羟基自由基的破坏,形成了卤代离子和新的烷烃类物质重新结合成新的卤代烷烃物质。
[Abstract]:Ozone, as an important oxidant in advanced oxidation technology, has been used to treat high concentration organic wastewater because of its strong oxidation ability and high oxidation speed. Landfill leachate is a kind of wastewater containing macromolecule and difficult to degrade organic matter. At present, the traditional biochemical treatment has been difficult to meet the emission standard. As a new generation of landfill leachate treatment process, the advanced ozonation technology biochemical treatment can not only reduce the treatment cost, but also be easy to form modular management. More and more attention has been paid to the secondary effluent of landfill leachate by UV/H2O2/O3 combined process, and the optimal operating conditions have been explored in this paper. A photochemical reactor suitable for the UV/H2O2/O3 system was designed, and the organic matter in the process of advanced oxidation degradation was analyzed. The following conclusions can be drawn: (1) the optimal operating conditions for advanced oxidation of landfill leachate secondary effluent by UV / H _ 2O _ 2 / O _ 3 combination process at room temperature 20 卤1 鈩，

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