对芯片工业生产中缺陷降低方法的研究

发布时间：2017-12-28 19:13

本文关键词：对芯片工业生产中缺陷降低方法的研究　出处：《湖北工业大学》2017年硕士论文　论文类型：学位论文

【摘要】：随着人类的发展和科技的进步,集成电路芯片工业生产的发展极其迅速。最近的几十年中,硅基半导体的应用大大促进了现代社会生产力水平的快速发展,如超大规模集成电路的发明和发展引发了各行各业日新月异的技术进步,人们的物质文化水平也因之产生了深刻的变化。30多年来,计算机的性能提高了1万倍,价格却降至当初的万分之一。晶体管数量的增加是通过不断缩小晶体管的线宽来实现的,晶体管的线宽先后从20世纪90年代的0.5微米、0.35微米、0.25微米、0.18微米一直发展到目前的90纳米及以下的工艺。而在整个集成电路芯片工业生产过程中,缺陷检测和改善是个重要问题,关系着产品良品率和公司的生计。及时发现并改善问题,缩小影响面,并掌握基础缺陷状况,这是一套优秀的缺陷检测系统必须做到的。本文主要研究缺陷检测系统的工具和方法,包括了缺陷检测设备KLA和AIT的原理和方法,扩展到缺陷分析方法,趋势图,缺陷库及指定时间设备缺陷监控系统,研究缺陷分析及改善优化。经过研究,取得了预期的结果,并在实际工业生产中发挥了巨大的作用。运用所掌握的检测方法及系统资源,对几个异常缺陷模式进行了实战性的处理。合理的检测及有效的方法,能在提高整体工作效率的同时,也加快对缺陷的反馈速度和对重点机台的缺陷监控。
[Abstract]:With the development of human and the progress of science and technology, the development of integrated circuit chip industry is extremely rapid. In recent decades, the application of silicon based semiconductor greatly promoted the rapid development of modern social productivity level, such as the invention and development of large scale integrated circuit technology progress in all walks of life led to change rapidly, people's material and cultural level also because of the profound changes. For more than 30 years, the performance of computers has increased by 10 thousand times, and the price has dropped to 1/10000. The increase of transistors is achieved by reducing the linewidth of transistors. The linewidth of transistors has grown from 0.5 microns, 0.35 microns, 0.25 microns, and 0.18 microns in 1990s to the current technology of 90 nm and below. In the whole IC chip industrial production process, defect detection and improvement is an important issue, which is related to the good product rate and the company's livelihood. Timely detection and improvement of the problem, reduce the impact surface, and master the condition of basic defects, this is a set of excellent defect detection system must be done. This paper mainly studies the tools and methods of defect detection system, including the principles and methods of defect detection devices KLA and AIT. It extends to the defect analysis method, trend chart, defect library and designated time equipment defect monitoring system, and studies defect analysis and optimization. After research, the expected results have been obtained, and it has played a great role in the actual industrial production. Using the method and system resources mastered, several abnormal defect modes are dealt with in actual combat. Reasonable detection and effective methods can improve the efficiency of the whole work and speed up the feedback speed of the defect and monitor the defects of the key machine.
【学位授予单位】：湖北工业大学
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：TN405

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