不同膜层匹配下二氧化钒薄膜光电性能研究

发布时间：2018-03-14 14:00

本文选题：VO_2薄膜　切入点：缓冲层　出处：《深圳大学》2017年硕士论文　论文类型：学位论文

【摘要】：现代城市的楼宇建筑中,为了美观和提高采光率,玻璃门窗及幕墙占用面积不断提高。为了避免普通玻璃节能性差、耗能严重的问题,使用节能镀膜玻璃成为现代玻璃大厦最常见的节能措施,其中最常见的为Low-e镀膜玻璃。然而Low-e镀膜玻璃对太阳光谱的调节是固定的,其节能效果也是有限的。由于VO_2薄膜高低温相变前后对红外光透射率的突变性质,且其相变温度在室温附近,成为近年来人们冬暖夏凉“梦之窗”的研究热点。本论文围绕降低相变温度、提升可见光透过率及太阳光红外调节率等问题,研究了缓冲层、减反射层以及夹层结构对VO_2薄膜光电性能的影响。采用电子束热蒸发在常温下分别沉积了100nm Al_2O_3和TiO_2薄膜作为缓冲层,通过直流反应磁控溅射在不同缓冲层上分别制备了VO_2薄膜。结果表明,缓冲层诱导了VO_2薄膜的生长,提高了VO_2的结晶质量,光电性能得到一定改善,且一定程度上降低了薄膜的相变温度。其中采用TiO_2缓冲层所沉积VO_2薄膜在微结构和相变性能方便表现最好。通过磁控溅射沉积了不同时间Ti预制层,在Ti预制层上生长VO_2薄膜,研究了薄膜样品的光电特性。结果表明,Ti预制层改变了VO_2薄膜的c轴长度,大大降低了VO_2薄膜的相变温度至45°C。高温沉积VO_2薄膜过程生成TiO_2层,引起膜层间干涉,可见光透过率较单层VO_2薄膜有明显提升。通过将透明度高的MgF_2,Al_2O_3,TiO_2薄膜沉积于良好光电性能的VO_2薄膜以作为减反射层,提高VO_2薄膜的可见光透射率。结果表明,沉积减反层的薄膜样品可见光最大透过率及太阳光调控效果明显提升,且沉积双层减反层优于单层减反层的薄膜样品。其中,VO_2/TiO_2/Al_2O_3光学透过率波形与梦之窗最为相近,太阳光的调控能力最好,通过计算,太阳能调节率接近10%,其近红外调节率接近35%,相比单层VO_2薄膜提升高达13%。在结晶效果较好的MgF_2膜表面沉积了VO_2薄膜。研究发现,高温沉积VO_2薄膜过程导致MgF_2中的部分Mg~(2+)和F-掺杂进入薄膜。一方面,薄膜相变温度下降,光谱吸收边发生蓝移,可见光最大透过率提升。另一方面,蓝移导致薄膜太阳能调节效果有所下降。沉积MgF_2/VO_2/MgF_2夹层结构的多层膜。结果表明,薄膜可见光最大透过率及太阳光调控效果比单层VO_2和单层MgF_2缓冲层样品有明显提升。其可见光最大透过率达55%,太阳能及近红外调控效果分别为7.64%和27.46%。
[Abstract]:In modern urban buildings, the area occupied by glass doors, windows and curtain walls has been continuously increased in order to improve the lighting efficiency and beauty. In order to avoid the problem of poor energy saving and serious energy consumption of ordinary glass, The use of energy-efficient coated glass has become the most common energy-saving measure in modern glass buildings, the most common of which is Low-e coated glass. However, the regulation of solar spectrum by Low-e coated glass is fixed. The energy saving effect is also limited. Due to the abrupt properties of infrared transmittance before and after the phase transition at high and low temperatures, the phase transition temperature of VO_2 thin films is near room temperature. In recent years, it has become a hot topic in the study of "window of dreams" in winter, summer and cool. In this paper, the buffer layer is studied around lowering the temperature of phase transition, increasing the transmittance of visible light and adjusting the infrared rate of solar light, etc. The effect of antireflection layer and interlayer structure on the optical and electrical properties of VO_2 thin films was investigated. The 100nm Al_2O_3 and TiO_2 films were deposited as buffer layers by electron beam thermal evaporation at room temperature, respectively. VO_2 thin films were prepared on different buffer layers by DC reactive magnetron sputtering. The results show that the buffer layer induces the growth of VO_2 thin films, improves the crystallization quality of VO_2, and improves the optoelectronic properties to some extent. The phase transition temperature of the film is reduced to a certain extent, among which the VO_2 films deposited by TiO_2 buffer layer have the best microstructures and phase transformation properties. VO_2 thin films have been deposited on Ti prefabricated layers at different times by magnetron sputtering, and VO_2 thin films have been grown on Ti prefabricated layers. The optical and electrical properties of the thin film samples are studied. The results show that the C axis length of VO_2 films is changed by Ti prefabricated layers, and the phase transition temperature of VO_2 thin films is greatly reduced to 45 掳C. the formation of TiO_2 layers during the deposition of VO_2 films at high temperature results in interlayer interference. The transparent MgF2Al2O3TiO2 thin film was deposited on the VO_2 thin film with good photoelectric properties to improve the visible light transmittance of the VO_2 thin film as a antireflection layer. The results show that the visible light transmittance of the VO_2 thin film can be improved by the addition of the MgF2Al2O3TiO2 thin film to the VO_2 thin film with good optoelectronic properties. The maximum transmittance of visible light and the control effect of solar light of the thin film sample deposited by the anti-reflection layer were improved obviously, and the double layer anti-reflection layer was better than the thin film sample of the single-layer anti-reflection layer, and the optical transmittance waveform of the thin film sample deposited by the anti-reflection layer was the most similar to that of the dream window. The solar power is the best. By calculation, the solar energy regulation rate is close to 10, and the near infrared regulation rate is close to 35. Compared with the monolayer VO_2 film, the solar energy regulation rate is up to 13%. The VO_2 film was deposited on the surface of the MgF_2 film with better crystallization effect. The deposition of VO_2 films at high temperature results in partial Mg~(2) and F- doping in MgF_2. On the one hand, the phase transition temperature of the films decreases, the absorption edge of the films is blue shifted, and the maximum transmittance of visible light increases, on the other hand, The blue shift results in a decrease in the effect of solar energy regulation on the thin films. The results show that the multilayer films with MgF_2/VO_2/MgF_2 intercalation structure are deposited. The maximum transmittance of visible light and the control effect of solar light in the thin film were significantly improved than those in the single layer VO_2 and single layer MgF_2 buffer layer. The maximum visible light transmittance of the film was 55 and that of solar energy and near infrared was 7.64% and 27.46, respectively.
【学位授予单位】：深圳大学
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：TQ135.11;TB383.2

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