衬底表面状态对碲镉汞薄膜表面起伏的影响

发布时间：2018-08-22 07:55

【摘要】：通过改变碲锌镉衬底的表面加工方法及溴-甲醇腐蚀液的浓度,研究衬底的表面状态对碲镉汞薄膜表面起伏情况的影响。利用傅里叶红外透射(FTIR)光谱议、晶片扫描成像系统、光学显微镜等工具对不同条件下的碲镉汞薄膜的表面起伏情况进行观察和比较。研究初步发现碲锌镉衬底不经过化学抛光,以及不经过腐蚀直接进行外延的情况下得到的碲镉汞薄膜的表面起伏状况会得到一定程度的改善,但是考虑溴-甲醇腐蚀液对机械抛光造成的表面应力的释放作用以及外延过程中的衬底回熔的相互作用会使得外延所得碲镉汞薄膜表面起伏情况更加复杂。因此,仍需要对衬底使用前的化学抛光对薄膜表面起伏的作用以及确定合适的溴-甲醇腐蚀液的浓度进行进一步的研究。
[Abstract]:The effect of substrate state on the surface undulation of HgCdTe thin films was studied by changing the surface processing method of CdTe substrate and the concentration of Bromine-methanol etchant. The surface undulation of HgCdTe films prepared on CdTe substrates without chemical polishing and direct epitaxy without etching is improved to a certain extent. However, the effect of Bromine-methanol etchant on the surface stress release caused by mechanical polishing and its external effects are considered. The surface fluctuation of HgCdTe films prepared by epitaxy is more complicated due to the interaction of substrate remelting during epitaxy. Therefore, the effect of chemical polishing prior to substrate use on the surface fluctuation of HgCdTe films and the determination of appropriate concentration of Bromine-methanol etchant still need further study.
【作者单位】：华北光电技术研究所;
【分类号】：TB383.2

【相似文献】