孪生靶磁控溅射TiAIN硬质膜及性能研究
发布时间：2018-11-21 14:02
【摘要】：由于孪生靶可以克服Ti-A1合金靶造价高,制备过程中对膜层成分控制难以及合金结构中的孔隙等缺陷造成的辉光放电不稳定等一系列问题受到人们的广泛关注。但目前制备TiAlN三元复合薄膜多采用孪生Ti靶或孪生Al靶,这种靶材安装方式使真空镀膜室中的靶材至少是三个或更多,靶材个数的增加使镀膜设备结构变得复杂化,不利于节约成本,基于这种情况,本文创造性地采用Ti、Al两种物理性质差异较大的金属材料组成孪生Ti-A1靶制备TiAlN薄膜并探索其相应的制备工艺就显得极为重要。 本文采用孪生靶磁控溅射技术在Q235低碳钢基体上制备了TiAIN薄膜,研究了负偏压幅值、占空比、工作气压和靶电流对TiAlN薄膜表面形貌、膜厚、硬度、耐腐蚀性的影响并通过原子力显微镜(AFM)、台阶仪、纳米压痕仪和电化学腐蚀平台对TiAIN薄膜的表面形貌、膜厚、硬度和耐腐蚀性进行表征。同时,考虑到负偏压在磁控溅射镀膜中对等离子体中带电粒子的重要影响作用,研究了负偏压幅值对薄膜物质成分的影响并通过X射线光电子能谱仪(XPS)薄膜物质成分进行表征。 研究结果表明：提高靶电流、降低工作气压、选择合适的负偏压幅值和占空比能有效地降低薄膜表面粗糙度、提高粒径均匀性；薄膜的沉积速率受靶电流的影响最大；膜层主要成分为Ti、A1和N,通过调整负偏压可有效地调节膜层中A1/Ti原子比。通过XPS拟合结果可知,适当的增加负偏压的幅值大小可增加薄膜中的TiAlN含量。 通过纳米压痕仪和电化学腐蚀平台对薄膜的硬度和耐腐蚀性能检测并结合TiAlN薄膜表面形貌、膜厚分析可知,硬度受薄膜表面平整度、致密性和粒径均匀性影响较大,当薄膜粗糙度为2.75nm时硬度最高,为15.17GPa；薄膜的耐腐蚀能力受薄膜表面粗糙度和膜厚影响较大。粗糙度越小,膜厚值越大,薄膜的耐腐蚀性越强。
[Abstract]:Due to the fact that twin targets can overcome the high cost of Ti-A1 alloy targets, it is difficult to control the composition of the film during the preparation process, and a series of problems such as glow discharge instability caused by the defects in the structure of the alloy, such as glow discharge instability, have attracted extensive attention. However, at present, twinning Ti targets or twin Al targets are widely used in the preparation of TiAlN composite films. The installation of these targets makes the targets in the vacuum coating chamber at least three or more, and the increase of the number of targets complicates the structure of the coating equipment. Because of this situation, it is very important to use two kinds of metal materials with different physical properties of Ti,Al to form twinning Ti-A1 target to prepare TiAlN thin films and to explore the corresponding preparation technology. TiAIN thin films were prepared on Q235 low carbon steel substrates by twin target magnetron sputtering technique. The negative bias amplitude, duty cycle, working pressure and target current on the surface morphology, thickness and hardness of TiAlN films were studied. The surface morphology, film thickness, hardness and corrosion resistance of TiAIN films were characterized by atomic force microscope (AFM) (AFM), step tester, nano-indentation instrument and electrochemical corrosion platform. Considering the important effect of negative bias voltage on charged particles in plasma deposited by magnetron sputtering, The effect of negative bias amplitude on the composition of (XPS) thin films was investigated and characterized by X-ray photoelectron spectroscopy (XPS). The results show that increasing the target current, reducing the working pressure, choosing the proper negative bias amplitude and duty cycle can effectively reduce the surface roughness and improve the particle size uniformity of the film, and the deposition rate of the film is most affected by the target current. The main components of the film are Ti,A1 and N.The A1/Ti atom ratio in the film can be adjusted effectively by adjusting the negative bias voltage. The results of XPS fitting show that increasing the amplitude of negative bias voltage can increase the content of TiAlN in the film. The hardness and corrosion resistance of TiAlN films were tested by nano-indentation and electrochemical corrosion platform. The film thickness analysis showed that the hardness was greatly affected by surface smoothness, compactness and particle size uniformity. When the roughness of the film is 2.75nm, the hardness is the highest, 15.17GPa. The corrosion resistance of the films is greatly affected by the surface roughness and thickness of the films. The smaller the roughness, the greater the thickness of the film and the stronger the corrosion resistance of the film.
【学位授予单位】：哈尔滨商业大学
【学位级别】：硕士
【学位授予年份】：2014
【分类号】：TB43
本文编号：2347190
[Abstract]:Due to the fact that twin targets can overcome the high cost of Ti-A1 alloy targets, it is difficult to control the composition of the film during the preparation process, and a series of problems such as glow discharge instability caused by the defects in the structure of the alloy, such as glow discharge instability, have attracted extensive attention. However, at present, twinning Ti targets or twin Al targets are widely used in the preparation of TiAlN composite films. The installation of these targets makes the targets in the vacuum coating chamber at least three or more, and the increase of the number of targets complicates the structure of the coating equipment. Because of this situation, it is very important to use two kinds of metal materials with different physical properties of Ti,Al to form twinning Ti-A1 target to prepare TiAlN thin films and to explore the corresponding preparation technology. TiAIN thin films were prepared on Q235 low carbon steel substrates by twin target magnetron sputtering technique. The negative bias amplitude, duty cycle, working pressure and target current on the surface morphology, thickness and hardness of TiAlN films were studied. The surface morphology, film thickness, hardness and corrosion resistance of TiAIN films were characterized by atomic force microscope (AFM) (AFM), step tester, nano-indentation instrument and electrochemical corrosion platform. Considering the important effect of negative bias voltage on charged particles in plasma deposited by magnetron sputtering, The effect of negative bias amplitude on the composition of (XPS) thin films was investigated and characterized by X-ray photoelectron spectroscopy (XPS). The results show that increasing the target current, reducing the working pressure, choosing the proper negative bias amplitude and duty cycle can effectively reduce the surface roughness and improve the particle size uniformity of the film, and the deposition rate of the film is most affected by the target current. The main components of the film are Ti,A1 and N.The A1/Ti atom ratio in the film can be adjusted effectively by adjusting the negative bias voltage. The results of XPS fitting show that increasing the amplitude of negative bias voltage can increase the content of TiAlN in the film. The hardness and corrosion resistance of TiAlN films were tested by nano-indentation and electrochemical corrosion platform. The film thickness analysis showed that the hardness was greatly affected by surface smoothness, compactness and particle size uniformity. When the roughness of the film is 2.75nm, the hardness is the highest, 15.17GPa. The corrosion resistance of the films is greatly affected by the surface roughness and thickness of the films. The smaller the roughness, the greater the thickness of the film and the stronger the corrosion resistance of the film.
【学位授予单位】：哈尔滨商业大学
【学位级别】：硕士
【学位授予年份】：2014
【分类号】：TB43
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