表面杂质诱导薄膜元件的热应力损伤
发布时间：2019-01-19 17:39
【摘要】：基于薄膜元件的热力学理论,建立了强激光连续辐照下薄膜元件的热分析模型,模拟了薄膜元件表面杂质吸热后向周围薄膜进行热传递的过程,并讨论了表面洁净度等级和杂质尺寸对薄膜元件热应力损伤的影响。研究结果表明:强激光连续辐照下,表面杂质会吸收激光能量产生较大的温升,激光辐照时间越长,功率密度越大,杂质的温升也越大;吸热后,达到熔点的杂质和未达到熔点的杂质分别通过热传导和热辐射的方式向周围薄膜传递热量,通过热传导作用在薄膜元件表面引起的温升明显高于热辐射作用引起的;杂质向周围薄膜传递热量后会在薄膜元件上产生非均匀的温度梯度,进而产生热应力,热应力随着温度梯度的增加而增大,且处于一定尺寸范围内的杂质,更容易诱导薄膜元件热应力损伤;此外,薄膜元件的表面洁净度等级越高,杂质粒子的数目越多,越易于造成薄膜元件的热应力损伤。
[Abstract]:Based on the thermodynamics theory of thin film element, the thermal analysis model of film element under continuous intense laser irradiation is established, and the process of heat transfer from impurities on the surface of film element to the surrounding film is simulated. The effects of surface cleanliness and impurity size on thermal stress damage of thin film elements are discussed. The results show that the surface impurities absorb the laser energy to produce a larger temperature rise under continuous intense laser irradiation. The longer the laser irradiation time, the greater the power density, and the greater the temperature rise of the impurity. After heat absorption, the impurities reaching the melting point and the impurities that do not reach the melting point transfer heat to the surrounding film by heat conduction and heat radiation, respectively. The temperature rise caused by the heat conduction on the surface of the film is obviously higher than that caused by the thermal radiation. When the impurity transfers heat to the surrounding film, it will produce a non-uniform temperature gradient on the film element, and then produce the thermal stress. The thermal stress increases with the increase of the temperature gradient, and the impurity is in a certain size range. It is easier to induce thermal stress damage of thin film elements. In addition, the higher the level of surface cleanliness of thin film elements, the more the number of impurity particles, the easier to cause thermal stress damage of thin film elements.
【作者单位】： 四川大学电子信息学院;
【基金】：苏州大学省级重点实验室开放课题(KSJ1404) 科技部创新人才推进计划重点领域创新团队(2014RA4051)
【分类号】：O484
本文编号：2411593
[Abstract]:Based on the thermodynamics theory of thin film element, the thermal analysis model of film element under continuous intense laser irradiation is established, and the process of heat transfer from impurities on the surface of film element to the surrounding film is simulated. The effects of surface cleanliness and impurity size on thermal stress damage of thin film elements are discussed. The results show that the surface impurities absorb the laser energy to produce a larger temperature rise under continuous intense laser irradiation. The longer the laser irradiation time, the greater the power density, and the greater the temperature rise of the impurity. After heat absorption, the impurities reaching the melting point and the impurities that do not reach the melting point transfer heat to the surrounding film by heat conduction and heat radiation, respectively. The temperature rise caused by the heat conduction on the surface of the film is obviously higher than that caused by the thermal radiation. When the impurity transfers heat to the surrounding film, it will produce a non-uniform temperature gradient on the film element, and then produce the thermal stress. The thermal stress increases with the increase of the temperature gradient, and the impurity is in a certain size range. It is easier to induce thermal stress damage of thin film elements. In addition, the higher the level of surface cleanliness of thin film elements, the more the number of impurity particles, the easier to cause thermal stress damage of thin film elements.
【作者单位】： 四川大学电子信息学院;
【基金】：苏州大学省级重点实验室开放课题(KSJ1404) 科技部创新人才推进计划重点领域创新团队(2014RA4051)
【分类号】：O484
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