Deposition of organosilicone thin film from hexamethyldisilo

发布时间：2024-01-17 14:46

　　The deposition of organosilicone thin films from hexamethyldisiloxane(HMDSO) by using a dual-frequency(50 kHz/33 MHz) atmospheric-pressure micro-plasma jet with an admixture of a small volume of HMDSO and Ar was investigated.The topography was measured by using scanning electron microscopy.The chemical bond and composition of these films were analyzed by Fourier transform infrared spectroscopy(FTIR) and x-ray photoelectron spectroscopy.The results indicated that the as-deposited film was constit...

【文章页数】：7 页

【文章目录】：
1. Introduction
2. Experiment
3. Discussions and analysis
    3.1. Results of spectra measurements
    3.2. Film characterization techniques
4. Functional property of the films:hardness
5. Conclusion



本文编号：3879272