计算脉冲电子束辐照下能量沉积剖面的新方案

发布时间：2018-04-11 20:03

本文选题：脉冲电子束 + 电子束发散角　；参考：《核技术》2016年12期

【摘要】：脉冲电子束辐照材料试验研究中,束流电子具有不同的速度和角度分布。但数值模拟计算一般都考虑电子束垂直入射靶材料,这可能导致数值计算结果与试验结果不符。针对该问题,提出了一种计算电子束辐照下能量沉积剖面的新方案,利用MCNP(Monte Carlo N Particle Transport Code)软件对铝、铜、钽金属材料在电子束辐照下的能量沉积进行模拟,分析了电子束垂直入射与带有角度分布入射时能量沉积的差异,为解释电子束辐照试验测量数据与理论计算结果之间的差异提供了依据。
[Abstract]:In the experimental study of pulsed electron beam irradiated materials, the beam electron has different velocity and angle distribution.However, the vertical incidence of electron beam is generally taken into account in the numerical simulation, which may cause the numerical results to be inconsistent with the experimental results.In order to solve this problem, a new method for calculating the energy deposition profile under electron beam irradiation is proposed. The energy deposition of aluminum, copper and tantalum metals under electron beam irradiation is simulated by MCNP(Monte Carlo N Particle Transport code.The difference of energy deposition between the vertical incidence of electron beam and the incident with angular distribution is analyzed, which provides a basis for explaining the difference between the measured data of electron beam irradiation test and the theoretical calculation results.
【作者单位】：国防科学技术大学理学院工程物理研究所;长沙理工大学近地空间电磁环境监测与建模湖南省普通高校重点实验室;
【基金】：国家自然科学基金(No.11002162) 武器装备预研项目(No.51311020201) 长沙理工大学近地空间电磁环境监测与建模湖南省普通高校重点实验室开放基金项目(No.20150104)资助~~
【分类号】：V250.2;V445.16

【相似文献】