基于二氧化钒的辐射率可调涂层设计

发布时间：2018-04-18 11:10

本文选题：智能热控涂层 + 二氧化钒　；参考：《宇航材料工艺》2016年03期

【摘要】：设计了基于VO_2的非对称FP腔薄膜结构的智能热控涂层,并应用光学模拟计算的方法研究了不同膜层厚度对薄膜结构辐射率的影响,以及辐射率随角度的变化规律。计算结果表明,当相变层VO_2层的厚度从15 nm增至120 nm时,薄膜结构的辐射率变化Δε先增加再减小,VO_2厚度为50 nm时,Δε达到最大,约为0.6。介质层HfO_2的厚度主要影响多层薄膜结构的高温吸收带位置,但Δε在HfO_2层厚度为800~1 000 nm,均可达到约0.6的最大值。多层薄膜结构在0°~70°,仍保持明显的辐射率变化,Δε在0.4以上。
[Abstract]:The intelligent thermal control coating of asymmetric FP cavity film structure based on VO_2 is designed. The influence of different film thickness on the emissivity of the thin film structure and the variation rule of emissivity with angle are studied by optical simulation.The results show that when the thickness of the VO_2 layer increases from 15 nm to 120 nm, 螖蔚 increases first and then decreases when the thickness of VO _ 2 is 50 nm, 螖蔚 reaches the maximum, about 0.6 nm.The thickness of dielectric layer HfO_2 mainly affects the location of high temperature absorption band of multilayer structure, but 螖蔚 can reach the maximum value of about 0.6 when the thickness of HfO_2 layer is 800 ~ 1 000 nm.The structure of the multilayer film is at 0 掳and 70 掳, and the emissivity of the multilayer film remains obvious, 螖蔚 is more than 0.4.
【作者单位】：中国科学院上海硅酸盐研究所;北京卫星环境工程研究所;
【分类号】：V444.3

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