硬质合金表面TiAlN纳米多层膜的制备及性能研究

发布时间：2018-04-11 17:40

  本文选题：TiAlN纳米多层膜 + 硬质合金　； 参考：《重庆理工大学》2015年硕士论文

【摘要】：利用磁控溅射技术,通过调整工艺参数:氮气流量、基体偏压、溅射功率、沉积温度、调制周期以及调制比,在硬质合金基体表面制备一系列TiAlN纳米多层膜,综合利用纳米压痕、X射线衍射、扫描电子显微镜、热重分析、电化学腐蚀等技术手段对TiAlN纳米多层膜进行结构和性能表征,研究了磁控溅射工艺对纳米多层膜结构和性能的影响,探讨了纳米多层膜结构与性能之间的影响机制,获得了具有超硬性以及优良的耐磨、抗高温和耐腐蚀性能薄膜的制备工艺,为硬质合金基体材质的表面改性,特别是刀具表面超硬涂层的获得提供了有益参考。主要研究结果如下:(1)影响TiN薄膜与硬质合金基体结合力以及其本身硬度的影响因素中,影响权重依次为:R偏压R氮流量R功率R温度,随着基体偏压的增加,薄膜的硬度升高但与基体的结合强度降低;综合考虑硬度和结合力,选择偏压-150V、氮流量35sccm、沉积温度150℃以及Ti靶功率1000W作为制备TiN过渡层的工艺参数。(2)TiN/AlN纳米多层膜的硬度与氮流量之间存在一定的关联,但并未表现出一定的规律性,当氮流量为25sccm时,薄膜表现出较高的硬度,达到2900HV;表面形貌在氮流量为25sccm与35sccm时较为平整。(3)随着偏压的增大,TiN/AlN纳米多层膜的硬度先增加后降低,在偏压为-100V时,薄膜表现出较高的硬度值,达到2800HV,且表面形貌最优。(4)不同调制周期的TiN/Al N纳米多层膜中均仅存在立方结构的TiN和AlN相;调制周期与TiN/AlN纳米多层膜的硬度之间表现出显著的关联性,当且仅当调制周期厚度在5~7nm范围内时,薄膜表现出显著的超硬特性,当调制周期为5.6nm时薄膜的显微硬度均值达到35GPa,同时表现出最好的抗腐蚀性能;纳米多层薄膜的耐磨性和耐高温氧化性随调制周期的减小(周期数与界面数量的增加)而单调升高,调制周期为3.6nm的薄膜耐磨性和耐高温氧化性能最优。(5)调制比的变化造成了TiN/AlN纳米多层膜中晶体结构的差异,当调制比为1:35时,薄膜中仅存在立方结构的TiN和AlN,此时薄膜表现出超硬性(显微硬度均值35GPa),且该薄膜具有最优的耐磨性和耐腐蚀性能;调制比为1:25的TiN/AlN纳米多层薄膜表现出最好的耐高温氧化性能。(6)通过论文的研究,综合考虑TiAlN涂层的应用实际,硬质合金刀具表面涂层设计的最佳方案为:过渡层(Ti+TiN)+TiN/AlN(调制周期5-7nm,调制比1:35)。
[Abstract]:A series of TiAlN nanocrystalline multilayers were prepared on cemented carbide substrate by means of magnetron sputtering technology by adjusting the process parameters: nitrogen flow rate, substrate bias, sputtering power, deposition temperature, modulation period and modulation ratio.The structure and properties of TiAlN nanocrystalline multilayers were characterized by means of nano-indentation X-ray diffraction scanning electron microscope thermogravimetric analysis and electrochemical corrosion.The effect of magnetron sputtering technology on the structure and properties of nanocrystalline multilayer films was studied. The influence mechanism between the structure and properties of nano-multilayer films was discussed.The preparation process of high temperature and corrosion resistant films provides a useful reference for the surface modification of cemented carbide substrates, especially for the acquisition of superhard coatings on tool surfaces.The main results are as follows: (1) among the factors affecting the adhesion between TiN film and cemented carbide substrate and its hardness, the weight of influence is in turn R: r bias R N flux R power R temperature, and with the increase of substrate bias voltage,The hardness of the film increases but the bonding strength with the substrate decreases.Choosing bias voltage -150V, nitrogen flow rate 35sccm, deposition temperature 150 鈩，

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