微弧氧化小阴极放电及膜层均匀性

发布时间：2018-07-06 14:18

本文选题：微弧氧化 + 小阴极　；参考：《中国表面工程》2015年03期

【摘要】：针对微弧氧化工艺中小功率电源大面积处理或局部腔体处理问题,研究小阴极微弧氧化工艺方法。采用550V恒压模式,阳极为Φ70mm×0.5mm的纯铝样件,阴极为Φ15mm不锈钢棒,浸没到硅酸钠基的电解液内的长度可变,探讨放电伏安特性和膜层厚度、表面形貌以及电化学行为的均匀性。结果表明:小阴极可以实现微弧氧化,但小阴极增加了阴极-阳极间放电的等效阻抗,会造成微弧放电较弱、成膜速率较低,微弧氧化样品的径向膜层厚度和耐蚀性呈现不均匀性,靠近样品边缘膜层较厚,中心区域膜层较薄;增加阴极尺寸,膜厚均匀性从74%(阴极深入20mm)提高到78%(阴极深入40mm),同时膜层的耐腐蚀区域加大。结果对于小功率电源大面积微弧氧化和腔体内部微弧氧化具有重要的指导意义。
[Abstract]:Aiming at the problem of large area treatment of small power supply or local cavity treatment in micro-arc oxidation process, the process method of micro-arc oxidation with small cathode is studied. A pure aluminum sample with a constant voltage mode of 550 V, a 桅 70mm 脳 0.5mm anode and a 桅 15mm stainless steel rod was used. The length of electrolyte immersed in sodium silicate was variable. The discharge voltammetry characteristics, film thickness, surface morphology and uniformity of electrochemical behavior were discussed. The results show that the micro-arc oxidation can be realized by the small cathode, but the small cathode increases the equivalent impedance of the cathode-anode discharge, which leads to the weak discharge of the micro-arc and the lower film forming rate. The radial film thickness and corrosion resistance of microarc oxidation samples show inhomogeneity, the film layer near the edge of the sample is thicker, the central area film is thin, and the cathode size is increased. The uniformity of film thickness was increased from 74% (cathode depth to 20mm) to 78% (cathode depth into 40mm), and the corrosion resistance of the film was increased. The results are of great significance for large-area micro-arc oxidation and internal micro-arc oxidation of small power supply.
【作者单位】：佳木斯大学黑龙江省高校生物医学材料重点实验室;
【基金】：国家自然科学基金(31370979) 黑龙江省高校创新团队建设计划项目(2012TD010)
【分类号】：TG174.4

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