不同厚度纳米Ti薄膜的力学性能

发布时间：2018-07-16 23:32

【摘要】：通过直流磁控溅射方法制备出四个不同厚度的纳米Ti薄膜,并分别采用纳米压痕仪、电子薄膜应力分布测试仪研究了Ti薄膜的力学性能和残余应力大小,结合分形维数方法和原子力显微镜对薄膜表面粗糙度和表面形貌进行了分析。实验结果表明:随Ti薄膜厚度的增加,薄膜晶粒尺寸逐渐增大,表面粗糙度和残余应力值随厚度的增加先增大后减小,而Ti薄膜弹性模量和硬度随薄膜厚度增加呈现出先减小随后增大的趋势。当薄膜厚度为600,2400,3600nm时薄膜中存在残余压应力,厚度为1200nm时存在残余拉应力,薄膜中残余应力分布最为均匀,但此时薄膜具有较低的硬度和弹性模量值。分析得出Ti薄膜中存在残余拉应力会使薄膜硬度和弹性模量值变小,残余压应力反之。
[Abstract]:Four nanocrystalline Ti thin films with different thickness were prepared by DC magnetron sputtering. The mechanical properties and residual stress of Ti thin films were studied by nano-indentation instrument and electron film stress distribution tester. The surface roughness and surface morphology of the films were analyzed by means of fractal dimension method and atomic force microscope (AFM). The experimental results show that the grain size increases with the increase of Ti film thickness, and the surface roughness and residual stress increase firstly and then decrease with the increase of Ti film thickness. However, the elastic modulus and hardness of Ti film decrease first and then increase with the increase of film thickness. When the thickness of the film is 600,2400Nm ~ 3600nm, there is residual compressive stress in the film, and when the thickness of the film is 1200nm, there is residual tensile stress. The distribution of the residual stress in the film is the most uniform, but the film has lower hardness and modulus of elasticity. It is concluded that the hardness and elastic modulus of Ti thin films will be reduced by the existence of residual tensile stress, whereas the residual compressive stress will be reversed.
【作者单位】：装甲兵工程学院装备再制造技术国防科技重点实验室;哈尔滨工程大学材料科学与化学工程学院;中国地质大学(北京)工程技术学院;
【基金】：北京市自然科学基金重大项目(3120001) 国家自然科学基金(51275105) 国家杰出青年科学基金(51125023)
【分类号】：TB383.2;TG146.23

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