磁控溅射制备V-Al-Ta-N四元涂层结构及其性能研究

发布时间：2018-10-11 12:26

【摘要】：过渡金属氮化物涂层具有优异的力学性能和摩擦磨损表现,在工业上获得广泛的应用。本文在V-Al-N涂层体系中引入过渡金属大原子Ta,利用反应磁控溅射的方法制备出不同Ta含量的(V,Al)1-xTaxN涂层。通过XANES、XRD、AFM、SEM、 TEM等分析手段对涂层结构和表面形貌进行分析,研究了Ta含量变化对涂层结构的影响并通过TRIM软件计算分析了长膜过程中各种粒子的能量分布情况；利用纳米压痕仪、维氏压痕仪、划痕仪对涂层力学性能和变形行为进行测试,研究了Ta含量对涂层力学性能的影响；在700℃条件下真空退火,初步研究了涂层的热稳定性；利用UMT-3型多功能摩擦磨损试验机对涂层摩擦磨损性能进行测试,通过对磨损率、摩擦系数和磨痕形貌的观察分析研究涂层的磨损性能。研究表明：1)所有涂层均为立方NaCl结构,Ta元素的含量对晶粒的取向有明显影响。Ta含量较低时涂层呈现(111)结构,当Ta含量较高时(x≥0.57)涂层(111)衍射峰完全消失,变为完全的(200)结构。同时Ta含量也影响柱状晶的生长结构,所有涂层均呈明显的柱状晶生长,Ta含量增加,涂层逐步变得更加致密,TRIM计算结果表明高能反弹粒子对膜表面的轰击作用可能增加了膜层表面原子的迁移率,使长膜时表面扩散增加,从而导致涂层生长结构的致密化。2)随着Ta含量的增加,涂层的力学性能有显著的提高。Ta含量x=0.03的涂层硬度只有13.8 GPa,而x=0.57的涂层硬度翻了一倍达到了29.8 GPa,涂层生长结构的致密化可能是硬度大幅提高的重要原因之一。加入一定量的Ta有利于提高涂层的韧性。压痕测试和划痕测试表明呈(200)结构的涂层(高Ta)抗裂纹能力更好,其不但有较高的硬度,韧性也较好,说明一定量Ta的加入对涂层的力学性能提高有较大影响。3)退火实验显示少量Ta的涂层(x≤0.18)退火后硬度有所提升,中等Ta含量的涂层(x=0.31、x=0.57)退火后硬度没有太大变化,处于相对较高水平,而过量Ta涂层(x=0.68)退火后硬度则下降明显。4)摩擦实验表明Ta含量的增加一定程度上可以降低涂层的初始摩擦系数,但同时也会导致涂层的磨损率增加。
[Abstract]:Transition metal nitride coatings have been widely used in industry due to their excellent mechanical properties and friction and wear properties. In this paper, transition metal large atom Ta, was introduced into V-Al-N coating system to prepare (VN Al) 1-xTaxN coatings with different Ta content by reactive magnetron sputtering. The structure and surface morphology of the coating were analyzed by means of XANES,XRD,AFM,SEM, TEM, the effect of Ta content on the coating structure was studied, and the energy distribution of various particles in the long film was calculated by TRIM software. The mechanical properties and deformation behavior of the coatings were tested by Vickers indentation instrument, the effect of Ta content on the mechanical properties of the coatings was studied, and the thermal stability of the coatings was preliminarily studied by vacuum annealing at 700 鈩，

本文编号：2264188