近场显微成像法识别高功率激光镜片薄膜内部缺陷

发布时间：2018-03-08 10:34

本文选题：薄膜　切入点：近场光学　出处：《中国激光》2017年01期 　论文类型：期刊论文

【摘要】：采用近场显微成像法测量了高功率激光镜片薄膜表面裂纹和内部节瘤缺陷,并分析了它们的形成机制。100nm孔径的圆锥形针尖辐射的倏逝波与薄膜中预埋的缺陷相互作用,将倏逝波转化为辐射波后,由物镜收集并在远场逐点成像,同步地获得薄膜表面的原子力显微镜(AFM)图像和扫描近场光学显微镜(SNOM)图像,以便直观地识别缺陷产生的物理机制。结果表明:在倏逝波的有效作用区域内,薄膜表面裂纹与内部节瘤可以同时精确地被识别。通过对比SNOM与AFM结果,发现基底表面裂纹在镀膜过程中积累了残余应力,这导致薄膜的表面呈层状断裂,其单条最小裂纹横向剖面尺寸为165nm,超过了传统远场检测的实验检测精度;此外,SNOM图中的亮斑表明,薄膜的内部有高于基底折射率的节瘤存在。
[Abstract]:The surface cracks and internal nodule defects of high power laser lens films were measured by near-field microscopic imaging. The interaction between the evanescent waves of the cone tip radiation with a .100nm aperture and the embedded defects in the films was analyzed. After the evanescent wave is transformed into a radiation wave, the atomic force microscope (AFM) image of the film surface and the scanning near-field optical microscope (SNOM) image are simultaneously obtained by the objective lens and the far-field imaging point by point. The results show that in the effective range of evanescent wave, the surface crack and internal ganglion can be accurately identified simultaneously. By comparing the results of SNOM and AFM, It is found that the residual stress accumulates in the process of coating on the substrate surface, which leads to the layered fracture on the surface of the thin film. The transverse section size of the single minimum crack is 165 nm, which is higher than the precision of the conventional far field measurement. In addition, the bright spots in SNOM show that there are nodule in the film which is higher than the refractive index of substrate.
【作者单位】：贵州大学贵州省光电子技术及应用重点实验室;贵州大学大数据与信息工程学院;
【基金】：国家自然科学基金(11204046) 科技部国际科技合作专项(2014DFA00670) 贵州省国际科技合作项目(黔科合外G字[2011]7001号) 贵阳市科技局项目(筑科合同[2012103]71号)
【分类号】：O484

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