离子束溅射氧化钽薄膜的光学带隙特性

发布时间：2018-08-06 19:57

【摘要】：Ta_2O_5薄膜是可见光到近红外波段中重要的高折射率薄膜材料之一。本文针对离子束溅射制备Ta_2O_5薄膜的光学带隙特性开展了实验研究工作,基于Cody-Lorentz模型表征了薄膜的光学带隙特性,重点针对薄膜的禁带宽度和Urbach带尾宽度与制备参数之间的相关性进行研究。研究结果表明:在置信概率95%以上时,对Ta_2O_5薄膜禁带宽度影响的制备参数,权重大小依次为氧气流量、基板温度、离子束电压;而对Ta_2O_5薄膜Urbach带尾宽度影响的制备参数,权重大小依次为基板温度和氧气流量。对于Ta_2O_5薄膜在超低损耗激光薄膜和高损伤阈值激光薄膜领域内应用,本文的研究结果给出了同步提高薄膜的禁带宽度和降低带尾宽度的重要工艺参数选择方法。
[Abstract]:Ta_2O_5 thin film is one of the important high refractive index thin film materials in the visible to near infrared band. In this paper, the optical band gap characteristics of Ta_2O_5 thin films prepared by ion beam sputtering have been studied experimentally. The optical band gap characteristics of the films have been characterized based on the Cody-Lorentz model. The correlation between the band gap width and the Urbach band tail width and the preparation parameters was studied. The results show that when the confidence probability is more than 95%, the weight of the preparation parameters of the influence on the band gap of Ta_2O_5 thin film is the oxygen flow rate, substrate temperature, ion beam voltage, and the preparation parameter of the Ta_2O_5 film Urbach band tail width, the weight of which is in the order of oxygen flow rate, substrate temperature, ion beam voltage, and so on. The weight is in turn the substrate temperature and oxygen flow. For the applications of Ta_2O_5 thin films in the field of ultra-low loss laser thin films and high damage threshold laser films, the research results in this paper give an important process parameter selection method for synchronously increasing the band gap and reducing the band tail width of the films.
【作者单位】：中国航天科工飞航技术研究院天津津航技术物理研究所天津市薄膜光学重点实验室;哈尔滨工业大学光电子技术研究所可调谐激光技术国防科技重点实验室;
【基金】：国家自然科学基金资助项目(No.61405145,No.61235011) 天津市自然科学重点基金资助项目(No.15JCZDJC31900) 中国博士后科学基金资助项目(No.2015T80115,No.2014M560104)
【分类号】：O484.41

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