大型真空磁控溅射镀膜装备控制稳定性及电工薄膜特性研究

发布时间：2018-04-21 13:45

本文选题：电工薄膜 + 空间磁场仿真分布　；参考：《兰州交通大学》2015年博士论文

【摘要】：电工钢是电力、电讯和仪表工业中不可缺少的重要磁性材料,与一个国家的电能消耗量密切相关。一直以来,电工钢的生产工艺复杂,制造技术严格;国内外的生产技术都以专利形式加以保护,视为企业的生命。电工用硅钢的制造技术和产品质量是衡量一个国家特殊钢生产和科技发展水平的重要标志之一。随着汽车、能源、化工、装备制造等主导产业的的高速增长,电工钢生产在质量、资源和环境等方面不断面临新的机遇和挑战。本论文利用大型真空磁控溅射绿色镀膜装备和技术,以冷轧钢卷为基材,通过在真空环境下对基材添加硅元素及制备基材表面电工绝缘薄膜,进行绿色镀膜工艺及其镀膜过程动态稳定控制和静态稳定控制的研究,力图探索和寻找提高电工钢性能及制备电工钢绝缘膜的绿色无污染的工艺和自动化技术。论文研究了磁控溅射的工作机理,分析了磁控溅射过程中低温等离子体的产生及微观物理过程。在上述基础上,依据能量守恒,建立了大型真空磁控溅射的控制模型。在建模过程和控制过程中,试图将原子尺度上的带电粒子和中性粒子的碰撞过程和集体效应与米量级的大尺度等离子体行为联系起来,并进行稳定控制。依据磁控溅射工作的特点,控制过程采用了自适应模糊PI控制策略。利用PI控制的快速性以及没有静态误差的特点,磁控溅射放电可由正常辉光放电快速进入异常辉光放电阶段;且在系统达到稳态阶段时,使磁控溅射镀膜系统的实际离子溅射工作电流与所期望的离子溅射工作电流完全一致。同时,利用模糊参数自整定技术,在线自适应整定PI控制器的控制参数,使动态响应好的模糊控制与稳态特性好的PI控制相结合,可以有效解决常规PI控制器对磁控溅射镀膜工作系统的控制存在大过调或振荡的问题,使模糊PI控制的大型真空磁控溅射镀膜系统的动态响应等离子体离子电流值不会跃出界限,保证磁控溅射过程不会由异常辉光放电阶段意外进入弧光放电阶段,从而保证磁控溅射电源及真空设备不会受到损坏,实现磁控溅射镀膜过程的动态稳定及静态稳定控制。磁控溅射镀膜过程是一个动态的过程,为实现工艺需要,本文提出了利用偏差变化变量以及偏差变量判定闭环系统稳定性及优化性能指标的方法,建立了在线自适应调整控制参数的模糊控制规则,判断规则简单,有利于进行PI参数的在线调整且适用于工程实际。仿真结果表明:PI参数在线模糊自整定控制磁控溅射过程为确保镀膜过程系统稳定,工艺标准提供了技术基础;整个磁控溅射镀膜过程在系统参数变动情况下可实现全自动稳定控制。实验结果表明:利用大型真空磁控溅射镀膜装备能够实现对冷轧钢片的深加工。通过在真空环境下对冷轧钢片添加硅元素及对其表面绝缘薄膜的制备,大型真空磁控溅射技术能够降低冷轧钢片的铁损,获得表面绝缘膜,提高电工钢性能。该工艺方法比较人工涂层具有自动化水平高,膜附着力强,没有毒害物质生成,生产过程绿色环保。整个生产过程在系统参数变化情况下可实现自动稳定控制。
[Abstract]:Electrical steel is an indispensable and important magnetic material in electric power, telecommunication and instrument industry. It is closely related to the energy consumption of a country. The production technology of electrical steel is complicated and the manufacturing technology is strict. The production technology at home and abroad is protected by patent form, it is regarded as the life of the enterprise. The manufacturing technology and production of silicon steel for electrical engineering Product quality is one of the important marks to measure the production of special steel and the development level of science and technology in a country. With the rapid growth of the leading industries such as automobile, energy, chemical industry and equipment manufacturing, the production of electrical steel is facing new opportunities and challenges in quality, resources and environment. This paper uses large vacuum magnetron sputtering green coating. Preparation and technology, using cold rolled steel coil as base material, adding silicon element to substrate in vacuum environment and preparing electrical insulation film on substrate surface, research on dynamic stability control and static stability control of green coating process and its coating process, trying to explore and find green film to improve the performance of electric steel and to prepare the green film of electrical steel. The working mechanism of magnetron sputtering is studied in this paper. The production and microphysical process of low temperature plasma in the magnetron sputtering process are analyzed. Based on the conservation of energy, the control model of large vacuum magnetron sputtering is established. In the process of modeling and control, the atomic scale is attempted. The collision process and the collective effect of the charged particles and the neutral particles are linked to the behavior of the large scale plasma in the meter scale. According to the characteristics of the magnetron sputtering, the adaptive fuzzy PI control strategy is adopted in the control process. The magnetron sputtering is used for the magnetron sputtering with the characteristics of PI control and without static error. The discharge can quickly enter the abnormal glow discharge stage from normal glow discharge, and when the system reaches steady state, the actual ion sputtering current of the magnetron sputtering coating system is exactly the same as the desired ion sputtering current. At the same time, the on-line adaptive tuning PI controller is used to control the control parameter by using the fuzzy parameter self tuning technique. The combination of the fuzzy control with good dynamic response and good PI control can effectively solve the problem that the conventional PI controller has a great over or oscillation in the control of the magnetron sputtering coating system, so that the dynamic response of the magnetron sputtering coating system controlled by the fuzzy PI can not jump out of the plasma ion current. It ensures that the magnetron sputtering process will not accidentally enter the arc discharge stage by the abnormal glow discharge stage, so that the magnetron sputtering power supply and the vacuum equipment will not be damaged, and the dynamic stability and static stability control of the magnetron sputtering coating process can be realized. The magnetron sputtering coating process is a dynamic process, which is necessary for the realization of the process. In this paper, a method to determine the stability of the closed loop system and the optimal performance index is proposed by using the variation of deviation variable and the deviation variable. The fuzzy control rule of the on-line adaptive adjustment control parameters is established. The rule is simple and the PI parameters are adjusted online and applied to the engineering practice. The simulation results show that the PI parameters are on-line model. In order to ensure the stability of the coating process system, the process standard provides a technical basis for the process system stability. The whole magnetron sputtering coating process can achieve full automatic stability control under the change of the system parameters. The experimental results show that the deep processing of cold rolled steel sheet can be realized by the large vacuum magnetron sputtering film equipment. In the vacuum environment, the silicon element is added to the cold rolled steel sheet and its surface insulation film is prepared. The large vacuum magnetron sputtering technology can reduce the iron loss of the cold rolled steel sheet, obtain the surface insulation film and improve the performance of the electrical steel. The whole production process can achieve automatic stability control under the change of system parameters.

【学位授予单位】：兰州交通大学
【学位级别】：博士
【学位授予年份】：2015
【分类号】：TM275

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