紫外自成像光刻及其缺陷修复效应研究

发布时间：2018-07-31 11:52

【摘要】：随着航空航天、显示照明、生物医疗等方面的不断发展,人们对周期微纳结构的要求日趋苛刻,需要同时满足大面积、高精度、图案复杂化、制备周期短、良品率高等条件。传统光刻术已无法满足需求而受到严重挑战,新型可批量生产、高精度、高良率的周期微纳加工技术逐渐成为研究热点。本文首先对现有的周期微纳加工技术及泰伯自成像光刻进行了相关调研。区别于传统光刻技术,泰伯自成像光刻不需要昂贵的光学成像系统,直接利用泰伯效应产生的周期物体自成像进行光刻,具有可修复周期微纳阵列存在的微小缺陷等优势。但因其自成像焦深浅,分辨率受掩模精度限制等问题,严重制约了泰伯光刻术在周期微纳结构制备领域的应用。因此,本文主要对紫外自成像光刻术和可克服有限焦深问题的扫描积分自成像光刻术进行深入研究。首先,从标量衍射理论出发,对紫外泰伯光刻技术的衍射成像机制以及光源的入射条件对其成像的影响进行了研究分析;在此基础之上对扫描积分泰伯光刻术的成像原理进行了理论推导,通过模拟仿真分析得出扫描积分泰伯光刻术具有克服有限焦深,同时可实现周期倍频的特性;进一步地,分析了影响扫描积分泰伯光刻术成像质量的主要因素;为验证该方法的可行性,对现有接近式光刻机进行优化改进,结合光刻工艺实验,探索了利用扫描积分泰伯光刻术制备周期倍频的振幅型光栅的实验方法。综上研究结果表明,上述方法可克服定位型泰伯光刻术的有限焦深问题,并能实现倍频的周期阵列制备,可将泰伯光刻术分辨率提高一倍。此外,本文还通过理论分析和模拟仿真的方法,拓展探究了紫外泰伯光刻术对存在缺陷的一维光栅和二维斜周期阵列的缺陷修复效应及其影响因素。模拟分析表明,当缺失面积小,缺失单元分散时,泰伯光刻术结合高对比度光刻胶特性,可较好的恢复缺失单元;当缺失面积大,缺失单元集中时,泰伯光刻术无法实现掩模的缺陷修复。
[Abstract]:With the development of aerospace, display lighting, biomedicine and so on, the requirement of periodic micro-nano structure is becoming more and more demanding, which needs to meet the requirements of large area, high precision, complicated pattern, short preparation period and high quality rate. Traditional photolithography has not been able to meet the needs of the serious challenges, a new batch production, high precision, high yield of periodic micro-nano processing technology has gradually become a research hotspot. In this paper, the existing periodic micro-nano processing technology and Taiber self-image lithography were investigated. Different from the traditional lithography technology, it does not need expensive optical imaging system, and it has the advantage of repairing the microdefects of periodic micro-nano arrays by directly using the periodic object image generated by the Tyber effect for lithography. However, the application of Taber photolithography in the fabrication of periodic micro-nano structures is seriously restricted because of its shallow image focus and limited resolution by mask precision. Therefore, this paper mainly focuses on UV self-imaging lithography and scanning integral self-imaging lithography, which can overcome the problem of limited focal depth. Firstly, based on the scalar diffraction theory, the diffraction imaging mechanism of UV Tieber lithography and the influence of the incident condition of the light source on the imaging are studied and analyzed. On the basis of this, the imaging principle of Scan-integral Taber lithography is deduced theoretically. Through simulation and simulation analysis, it is concluded that SIGT has the characteristics of overcoming the limited focal depth and realizing periodic frequency doubling. In order to verify the feasibility of the method, the existing proximity lithography machine is optimized and improved, combined with the experiment of lithography process, the paper analyzes the main factors that affect the imaging quality of the scanning integral Taber lithography, and in order to verify the feasibility of the method, the existing proximity lithography machine is optimized and improved. An experimental method for fabricating amplitude grating with periodic frequency doubling by scanning integral Taber lithography was investigated. The above results show that the proposed method can overcome the problem of limited focal depth in the localization Tyber lithography, and can be used to fabricate the periodic array of frequency doubling, which can double the resolution of the Taibor lithography. In addition, by means of theoretical analysis and simulation, the defect repair effect of ultraviolet Taber lithography on one dimensional grating and two dimensional oblique periodic array with defects and its influencing factors are extended. The simulation results show that when the missing area is small and the missing unit is dispersed, Taber lithography combined with high contrast photolithography can recover the missing unit well, and when the missing area is large, the missing unit is concentrated. Taber lithography can not achieve mask defect repair.
【学位授予单位】：中国科学院大学(中国科学院光电技术研究所)
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：TN23

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