等离子体在树脂基托消毒及根管锉表面去污中的应用

发布时间：2018-03-01 08:19

本文关键词： 等离子体丙烯酸树脂白色念珠菌生物膜消毒根管锉表面残留物氩气等离子体清理　出处：《南京医科大学》2017年硕士论文　论文类型：学位论文

【摘要】：第一部分等离子体对树脂基托表面白色念珠菌的杀灭研究实验一等离子体对树脂基托表面浮游白色念珠菌的杀灭试验目的:比较氩气、30%H_2O_2和50%H_2O_2等离子体对树脂基托表面浮游白色念珠菌的杀灭效果。方法:用聚甲基丙烯酸甲酯材料制作成9mm×9mm×2mm的试件56块,在浓度为1.0×108CFU/ml白色念珠菌PBS菌悬液中培养2h后取出,PBS轻漂两次,分为14组,每组4块试件。对照组不做处理,氩气等离子体分别处理20s、40s、60s、80s、100s,30%H_2O_2和50%H_2O_2等离子体分别处理5s、10s、15s、20s。处理后PBS液洗脱、系列稀释、涂板。48h后计数菌落形成单位,计算杀灭对数值。参考欧洲标准EN 1275-2005,处理后真菌减少4 log10CFU视为有效。结果:氩气等离子体处理100s、30%H_2O_2和50%H_2O_2等离子体处理15s后,基托表面浮游白色念珠菌数量降低均4 log10CFU,均能达到有效杀灭。结论:氩气、30%H_2O_2和50%H_2O_2等离子体均能有效杀灭树脂基托表面浮游白色念珠菌。30%H_2O_2和50%H_2O_2等离子体的杀菌性能优于氩气等离子体。实验二等离子体对树脂基托表面白色念珠菌生物膜的杀灭试验目的:评价氩气、30%H_2O_2和50%H_2O_2等离子体对树脂基托表面生物膜内白色念珠菌的杀灭效果。方法:将聚甲基丙烯酸甲酯材料制作成大小为9mm×9mm×2mm试件68块,在试件表面培养48h白色念珠菌生物膜。取64块试件随机分为对照组和15个处理组(n=4),对照组不做处理,氩气等离子体分别处理 60s、120s、180s、240s、300s,30%H_2O_2 和 50%H_2O_2 等离子体分别处理20s、40s、60s、80s、100s。处理后超声清洗、系列稀释、涂板。48h后计数菌落形成单位,计算杀灭对数值,评估杀菌效果。参考欧洲标准EN 1275-2005,处理后真菌减少4 log10CFU视为有效。剩余4块生物膜试件:1块作为对照组,其余3块分别用氩气、30%H_2O_2和50%H_2O_2等离子体处理300s,通过扫描电镜观察生物膜内白色念珠菌的损伤。结果:氩气等离子体处理300s、30%H_2O_2等离子体处理100s、50%H_2O_2等离子体处理80s后,基托表面生物膜内白色念珠菌数量减少均4 log10CFU。电镜下等离子体处理后的细胞膜表面粗糙,有孔洞,完整性破坏。结论:氩气、30%H_2O_2和50%H_2O_2等离子体均能有效杀灭生物膜内的白色念珠菌。30%H_2O_2和50%H_2O_2等离子体对白色念珠菌生物膜的杀灭效果较氩气等离子体更强。第二部分氩气等离子体对根管锉表面残留物清除效果的研究目的:研究氩气等离子体对根管锉表面残留污染物的清除效果。方法:取经过常规清洗、消毒流程的根管锉30根,分为对照组和4个实验组(n=6),对照组不做处理,实验组采用氩气等离子体分别处理5min、10min、15min、20min。扫描电镜观察根管锉表面污染物的清除情况,并对根管锉表面污染物做EDX分析。结果:氩气等离子体处理20min能有效清除根管锉表面的污染物。结论:氩气等离子体能有效清除根管锉表面残留的污染物,可用于口腔诊疗中根管锉的表面清理。
[Abstract]:The first part of the study on killing Candida albicans on resin base surface by plasma. Experiment on killing Candida albicans on resin base surface by plasma. Objective: to compare argon gas with 30H _ 2O _ 2 and 50H _ 2O _ 2 plasma on resin base. Killing effect of Candida albicans on Surface plankton methods: 56 specimens of 9 mm 脳 9 mm 脳 2 mm were made from polymethyl methacrylate material. After being cultured in 1.0 脳 10 8 CFU / ml Candida albicans PBS suspension for 2 hours, we took out the light bleaching of Candida albicans for 2 hours and divided them into 14 groups. The control group was untreated, and the argon plasma was treated with 20 s ~ 40 s ~ (60 s) ~ (60 s) ~ (60 sL) ~ (80 sL) ~ (30) H ~ (2 +) C ~ (2 +) O _ (2) and 50 ~ (10) H _ 2O _ (2) plasma for 5 s ~ (10) s ~ (10) s ~ (-1) ~ 15 s ~ (20) s ~ (20) s respectively. The PBS solution was eluted and removed after the treatment. Series dilution, coating plate .48h, count colony forming units, calculate logarithmic value of kill. Referring to European standard en 1275-2005, the fungal reduction of 4 log10CFU after treatment is regarded as effective. Results: argon plasma treatment of 100s ~ 30H _ 2O _ 2 and 50H _ 2O _ 2 plasma treatment for 15s, The number of Candida albicans on the base surface was reduced by 4 log10 CFU and the number of Candida albicans was reduced by 4 log10 CFU. Conclusion: the plasma can effectively kill Candida albicans. 30H _ 2O _ 2 and 50H _ 2O _ 2 plasma in Argon base base base. Conclusion: the plasma can kill effectively the bactericidal properties of the plasma of Argon base base surface of Candida albicans .30H _ 2O _ 2 and 50H _ 2O _ 2. Experiments on killing Candida albicans Biofilm on Resin-base Surface by Plasma compared with Argon Plasma objective: to evaluate the efficacy of Argon 30H _ 2O _ 2 and H _ 2O _ 2 Plasma on Candida albicans in Biofilm on Resin-base Surface. Methods: the material of polymethyl methacrylate was made into 68 pieces of specimen of 9 mm 脳 9 mm 脳 2 mm. Candida albicans biofilm was cultured on the surface of the specimen for 48 h. 64 specimens were randomly divided into control group and 15 treatment groups. The control group was not treated, and the argon plasma was treated with 60 sn 120 s1 180 s20 s20 s 40 s, 60 s0 60 s0 60 s1 80 s10 100 s, respectively. Series dilution, coating plate .48h, counting colony forming units, calculating logarithmic value of killing, evaluating bactericidal effect. Referring to European standard en 1275-2005, the fungus reduction of 4 log10CFU after treatment was regarded as effective. The remaining 4 biofilm specimen: 1 as control group, The other three pieces were treated with Argon 30 and 50 H2O2 plasma respectively for 300 s. The damage of Candida albicans in the biofilm was observed by scanning electron microscope. Results: after argon plasma treatment with 30% H2O2 plasma, the plasma was treated with 100 sg 50 H 2O 2 plasma for 80 s, and after the treatment of 50 H 2O 2 plasma for 80 s, the damage of Candida albicans in the biofilm was observed by SEM. The number of Candida albicans in biofilm on the base surface decreased by 4 log10 CFU. The surface of cell membrane treated by plasma under electron microscope was rough and porous. Conclusion: the plasma can effectively kill Candida albicans in the biofilm. The second part of argon plasma can kill Candida albicans in biofilm more effectively than argon plasma can kill Candida albicans biofilm with the plasma of 50 H2O2 and the plasma of 50 H2O2 can kill the biofilm of Candida albicans more effectively than that of Argon gas, the second part of argon can kill Candida albicans biofilm more effectively than Argon plasma. Study on the removal effect of gas plasma on the surface residue of root canal file objective: to study the effect of argon plasma on the removal of residual pollutants on the surface of root canal file. Thirty root canal files in the disinfection process were divided into control group and 4 experimental groups. The control group was not treated, the experimental group was treated with argon plasma for 5 min, 10 min, 15 min and 20 min, respectively. The surface contamination removal of root canal file was observed by scanning electron microscope (SEM). The surface contamination of root canal file was analyzed by EDX. Results: argon plasma treatment for 20 minutes could effectively remove the pollutants on the root canal file surface. Conclusion: argon plasma can effectively remove the residual pollutants on the root canal file surface. Can be used in oral diagnosis and treatment of root canal file surface cleaning.
【学位授予单位】：南京医科大学
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：R783

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